Methods utilizing scanning probe microscope tips and products therefor or produced thereby

Abstract

The invention provides a nanolithographic method, comprising: (i) providing a substrate; (ii) providing a nanoscopic tip coated with a patterning compound; (iii) contacting the coated tip with the substrate so that the patterning compound is applied to the substrate to produce a desired pattern; and (iv) wherein the patterning compound is anchored to the substrate.

1 - 45 . (canceled) 
     
     
         46 . A nanolithographic method, comprising:
 providing a substrate;   providing a nanoscopic tip coated with a patterning compound;   contacting the coated tip with the substrate so that the patterning compound is applied to the substrate to produce a desired pattern; and   wherein the patterning compound is anchored to the substrate.   
     
     
         47 . The nanolithographic method of  claim 46 , wherein the desired pattern has at least one lateral dimension of 1 micron or less. 
     
     
         48 . The nanolithographic method of  claim 46 , wherein the patterning compound is anchored to the substrate by chemisorption. 
     
     
         49 . The nanolithographic method of  claim 46 , wherein the patterning compound is anchored to the substrate by covalent bonds. 
     
     
         50 . The nanolithographic method of  claim 46 , further comprising applying a second compound to the desired pattern, wherein the second compound chemisorbs or covalently binds to the patterning compound. 
     
     
         51 . The nanolithographic method of  claim 46 , wherein the substrate is metal or metal oxide. 
     
     
         52 . The nanolithographic method of  claim 46 , wherein the substrate is a semiconductor. 
     
     
         53 . The nanolithographic method of  claim 46 , wherein the substrate magnetic. 
     
     
         54 . The nanolithographic method of  claim 46 , wherein the substrate is Si, SiO2 or glass. 
     
     
         55 . The nanolithographic method of  claim 46 , wherein the patterning compound comprises a nucleic acid or oligonucleotide. 
     
     
         56 . The nanolithographic method of  claim 46 , wherein the patterning compound comprises a protein or peptide. 
     
     
         57 . The nanolithographic method of  claim 46 , wherein the patterning compound comprises an sulfur-containing compound. 
     
     
         58 . The nanolithographic method of  claim 46 , wherein the patterning compound comprises an silane compound. 
     
     
         59 . The nanolithographic method of  claim 46 , wherein the patterning compound comprises an carboxylic acid, an amino compound, or an alcohol. 
     
     
         60 . The nanolithographic method of  claim 46 , wherein the patterning compound is coated onto the tip by dipping the tip into a composition comprising the patterning compound. 
     
     
         61 . The nanolithographic method of  claim 46 , wherein the method is carried out with a plurality of tips. 
     
     
         62 . The nanolithographic method of  claim 46 , wherein the desired pattern comprises an array of dots and/or lines. 
     
     
         63 . The nanolithographic method of  claim 46 , wherein the tip is a wet tip coated with the patterning compound and a solvent. 
     
     
         64 . A nanolithographic method, comprising:
 providing a substrate;   providing a nanoscopic tip;   coating the tip with a patterning compound; and   contacting the coated tip with the substrate so that the patterning compound is applied to the substrate to produce a desired pattern having at least one lateral dimension of 1 micron or less.   
     
     
         65 . A nanolithographic method, comprising:
 providing a substrate;   providing a plurality of nanoscopic tips;   coating the tips with a patterning compound; and   contacting the coated tips with the substrate so that the patterning compound is applied to the substrate to produce an array of dots or lines having at least one lateral dimension of 1 micron or less.