Composition for Removing Photoresist and/or Etching Residue From a Substrate and Use Thereof

Abstract

Compositions containing certain organic solvents comprising at least 50% by weight of a glycol ether and a quaternary ammonium compound are capable of removing residues such as photoresist and/or etching residue from an article.

1 . A composition for removing residue, the composition comprising:
 a) at least about 50% by weight of an organic solvent wherein at least about 50% of the organic solvent is a glycol ether;   b) at least about 0.5% by weight of a quaternary ammonium compound; and   c) a positive amount up to about 20% by weight of a corrosion inhibitor.   
     
     
         2 . The composition of  claim 1  wherein the glycol ether comprises a glycol mono (C 1 -C 6 ) alkyl ether. 
     
     
         3 . The composition of  claim 1  wherein the glycol ether comprises a (C 1 -C 20 ) alkanediol, a (C 1 -C 6 ) alkyl ether, or a (C 1 -C 20 ) alkanediol di(C 1 -C 6 ) alkyl ether. 
     
     
         4 . The composition of  claim 1  wherein the glycol ether is selected from ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol monoisopropyl ether diethylene glycol monobutyl ether, diethylene glycol monoisobutyl ether, diethylene glycol monobenzyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, triethylene glycol monomethyl ether, triethylene glycol dimethyl ether, polyethylene glycol monomethyl ether, diethylene glycol methyl ethyl ether, triethylene glycol ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether, propylene glycol dimethyl ether, propylene glycol monobutyl ether, propylene glycol, monoproply ether, dipropylene glycol monomethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoisopropyl ether, dipropylene monobutyl ether, dipropylene glycol diisopropyl ether, tripropylene glycol monomethyl ether, 1-methoxy-2-butanol, 2-methoxy-1-butanol, 2-methoxy-2-methylbutanol, 1,1-dimethoxyethane, and 2-(2-butoxyethoxy)ethanol. 
     
     
         5 . The composition of  claim 1  wherein the glycol ether is selected from the group consisting of propylene glycol monomethyl ether, propylene glycol monopropyl ether, tri(propylene glycol)monomethyl ether, and 2(2-butoxyethoxy)ethanol. 
     
     
         6 . The composition of  claim 1  wherein the quaternary ammonium compound comprises a C 1 -C 4  quaternary ammonium compound. 
     
     
         7 . The composition of  claim 1  wherein the quaternary ammonium compound is selected from tetramethylammounium hydroxide, tetraethylammounium hydroxide, tetrapropylammounium hydroxide, tetrabutylammounium hydroxide, trimethylethylammonium hydroxide, (2-hydroxyethyl)trimethylammonium hydroxide, (2-hydroxyethyl)triethylammonium hydroxide, (2-hydroxyethyl)tripropylammonium hydroxide, and (1-hydroxypropyl)trimethylammonium hydroxide. 
     
     
         8 . The composition of  claim 1  wherein quaternary ammonium compound comprises tetramethyl ammonium hydroxide. 
     
     
         9 . The composition of  claim 1  wherein the amount of the glycol ether is at least 50% by weight of the composition. 
     
     
         10 . The composition of  claim 1  wherein the amount of the glycol ether is about 50% to about 70% by weight of the composition. 
     
     
         11 . The composition of  claim 1  wherein the amount of the glycol ether is about 50% to about 60% by weight of the composition. 
     
     
         12 . The composition of  claim 1  wherein the amount of the quaternary ammonium compound is about 0.5% to about 15% by weight of the composition. 
     
     
         13 . The composition of  claim 12  wherein the amount of the quaternary ammonium compound is about 0.5% to about 5% by weight. 
     
     
         14 . The composition of  claim 1  which further comprises an auxiliary organic solvent. 
     
     
         15 . The composition of  claim 14  wherein the auxiliary organic solvent comprises a C 2 -C 20  alkane diol or a C 3 -C 20  alkane triol. 
     
     
         16 . The composition of  claim 14  wherein the auxiliary organic solvent comprises propylene glycol. 
     
     
         17 . The composition of  claim 16  wherein the amount of the propylene glycol is about 0.1 to about 40% of weight. 
     
     
         18 . The composition of  claim 1  being free from fluoride-containing compounds. 
     
     
         19 . The composition of  claim 1  wherein the composition comprises a fluoride-containing compound. 
     
     
         20 . The composition of  claim 1  which further comprises up to about 40% by weight of water. 
     
     
         21 . The composition of  claim 1  which further comprises up to about 20% by weight of a corrosion inhibitor. 
     
     
         22 . The composition of  claim 21  wherein the corrosion inhibitor comprises a hydroxylamine, an acid salt thereof; an organic acid, an acid salt thereof; and mixtures thereof. 
     
     
         23 . The composition of  claim 21  where the corrosion inhibitor comprises a hydroxylamine. 
     
     
         24 . The composition of  claim 23  wherein said hydroxylamine comprises diethyl hydroxylamine. 
     
     
         25 . A method for removing photoresist or etching residue or both from a substrate wherein comprises contacting said substrate with a composition comprising:
 a) at least about 50% by weight of an organic solvent wherein at least about 50% of said organic solvent is a glycol ether, and   b) at least about 0.5% by weight of a quaternary ammonium compound.