Mold for optical device with anti-reflection structure, method for producing the same, and optical device

Abstract

A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semisperical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical islandlike microparticles; and using the multiple island like microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum.

1 .- 9 . (canceled) 
     
     
         10 . An optical device comprising:
 a nano pattern having a nano structure of a fine depressed and elevated surface formed on a surface of a substrate and arranged randomly.   
     
     
         11 . The optical device according to  claim 10 , wherein the nano pattern of the optical device with the nano structure is constructed in such a manner as to hold an interval of a wavelength or less of a light source. 
     
     
         12 . The optical device according to  claim 10 , wherein the nano pattern includes a plurality of island-like particles having an average particle size in a range of 5 nm to 1000 nm, and wherein an average interval between adjacent island-like particles is in a range of 10 nm to 2000 nm. 
     
     
         13 . The optical device according to  claim 12 , wherein the nano pattern of the optical device with the nano structure is constructed in such a manner as to hold an interval of a wavelength or less of a light source. 
     
     
         14 . The optical device according to  claim 10 , wherein the nano pattern is produced by the steps:
 forming a thin film comprising a thin film material; and   causing aggregation or nucleation of the thin film material to form a plurality of island-like fine particles composed of the film by using a heat reaction or a photoreaction.   
     
     
         15 . The optical device according to  claim 14 , wherein the nano pattern of the optical device with the nano structure is constructed in such a manner as to hold an interval of a wavelength or less of a light source. 
     
     
         16 . An optical device, comprising:
 a nano pattern having a nano structure of a fine depressed and elevated surface formed on a surface of a substrate and arranged with an irregular size and at an irregular distance.   
     
     
         17 . The optical device according to  claim 16 , wherein the nano pattern of the optical device with the nano structure is constructed in such a manner as to hold an interval of a wavelength or less of a light source.