Polishing pad and method of producing the same

Abstract

The present invention mainly relates to a polishing pad and method of producing the same. The polishing pad comprises a base material having a surface for polishing a substrate, wherein the surface comprises a plurality of bundles of first long fibers and an elastomer embedded into the bundles. The bundles of first long fibers are entangled with each other.

1 . A polishing pad comprising a base material having a surface for polishing a substrate, wherein the surface comprises a plurality of bundles of first long fibers and an elastomer embedded into the bundles, and the bundles of first long fibers are entangled with each other. 
     
     
         2 . The polishing pad according to  claim 1 , wherein the bundles of first long fibers are randomly entangled with each other. 
     
     
         3 . The polishing pad according to  claim 1 , wherein the bundles of first long fibers are oriented in a predetermined direction. 
     
     
         4 . The polishing pad according to  claim 1 , wherein the bundles of first long fibers are parallel to the surface for polishing a substrate. 
     
     
         5 . The polishing pad according to  claim 1 , wherein the bundles of first long fibers comprise a first bundle and a second bundle, and the first bundle is surrounded by the second bundle. 
     
     
         6 . The polishing pad according to  claim 5 , wherein the first bundle comprises a first part, and the first part is parallel to each other; the second bundle comprises a second part placed between the first parts; and the second part is vertical to the first parts. 
     
     
         7 . The polishing pad according to  claim 1 , wherein the first long fiber is selected from the group consisting of a single fiber and composite fibers. 
     
     
         8 . The polishing pad according to  claim 1 , wherein the first long fiber is made of at least one material selected from the group consisting of polyamide, terephthalamide, polyester, polymethyl methacrylate, polyethylene terephthalate, polyacrylonitrile, and mixtures thereof. 
     
     
         9 . The polishing pad according to  claim 1 , wherein the length of the first long fiber is more than about 10 cm. 
     
     
         10 . The polishing pad according to  claim 1 , wherein the first long fiber is a sea-island fiber. 
     
     
         11 . The polishing pad according to  claim 1 , wherein the base material further comprises a fiber mat comprising meshes, and the fiber mat comprises second long fibers, and the second long fibers and the first long fibers are intertwined with each other. 
     
     
         12 . The polishing pad according to  claim 1 , wherein the elastomer is a foam resin. 
     
     
         13 . A polishing system comprising:
 a polishing pad according to  claim 1 ;   a substrate to be polished;   a slurry, wherein the slurry together with the polishing pad react chemically with the surface of the substrate to be polished;   wherein the first long fibers and the elastomer have the functions of carrying the slurry and removing the reacted surface of the substrate to be polished in a polishing process.   
     
     
         14 . A method of polishing a substrate, the method comprising a step of using the polishing pad according to  claim 1  to polish a surface of the substrate. 
     
     
         15 . A method of producing the polishing pad according to  claim 1 , comprising steps of:
 (a) providing a base material having a surface for polishing a substrate, wherein the surface comprises a plurality of bundles of first long fibers, and the bundles of first long fibers are entangled with each other;   (b) impregnating the surface of the base material with an elastomer solution; and   (c) curing the elastomer impregnated in the surface of the base material.   
     
     
         16 . The method according to  claim 15 , further comprising a step (c1) of washing the surface of the base material after the step (c). 
     
     
         17 . The method according to  claim 16 , further comprising a step (c2) of drying the surface of the base material after the step (c1). 
     
     
         18 . The method according to  claim 15 , further comprising a step (c3) of mechanically polishing the surface of the base material and the elastomer after the step (c).