DURABLE MgO-MgF2 COMPOSITE FILM FOR INFRARED ANTI-REFLECTION COATINGS

Abstract

This disclosure is directed to an optic having a composited MgO—MgF 2 infrared anti-reflective coating that is suitable for use in LWIR, MWIR and SWIR ranges, and is particularly suitable for use in the LWIR range. The coated optic disclosed herein passes the severe abrasion test with a barring force between 2 pounds and 2.5 pounds. The MgO—MgF 2 infrared anti-reflective coating has a thickness in the range of 500 nm to 1500 nm and a reflectance value R x at 12° of less than 2% in the wavelength range of 7.25 nm to 11.75 nm.

1 . An optic having a composited MgO—MgF 2  anti-reflective coating thereon suitable for use with infrared radiation having a wavelength in the range of 1 μm to 14 μm, said coating thickness being variable with said wavelength range, the coating thickness being in the range of 100 nm to 1500 nm. 
     
     
         2 . The optic according to  claim 1 , wherein in the 1-3 μm infrared wavelength range the coating thickness is in the range of 150 nm to 300 nm. 
     
     
         3 . The optic according to  claim 1 , wherein in the 3-5 μm infrared wavelength range the coating thickness is in the range of 250 nm to 450 nm. 
     
     
         4 . The optic according to  claim 1 , wherein in the 8-13 μm infrared wavelength range the coating thickness is in the range of 600 nm to 1500 nm. 
     
     
         5 . The optic according to  claim 1 , wherein the coated optic has a reflectance Rx of less than 2% in the wavelength range of 7.5 nm to 11.5 nm. 
     
     
         6 . The optic according to  claim 1 , wherein the coated optic has a reflectance of less than 1% in the wavelength range of 7.5 nm to 11.5 nm. 
     
     
         7 . The optic according to  claim 1 , wherein the coated optic has a transmission of greater than 60% in the wavelength range of 7.5 nm to 11.5 nm. 
     
     
         8 . The optic according to  claim 1 , wherein the coating on the coated optic passes an abrasion test with a barring force between 2 and 2.5 lbs. 
     
     
         9 . A method of depositing a thin film of a selected material on the surface of a substrate using plasma ion assisted deposition, the method having the steps of:
 providing a vacuum chamber and within said chamber:   providing a substrate on which a coating is to be deposited;   providing at a MgF 2  material source and vaporizing said material using an e-beam to provide a coating material vapor flux, said flux passing from said material source through a reversed mask to said substrate;   providing plasma ions contain oxygen ion within said plasma from a plasma source;   rotating said substrate at a selected rotation frequency f; and   depositing said coating material on said substrate as a coating film and bombarding said substrate and said film with said plasma ions before and during said material depositions;   wherein the method forms a smooth, dense uniform composited MgO—MgF 2  coating.   
     
     
         10 . The method according to  claim 9 , wherein the coating material deposited on said substrate passes an abrasion test with a barring force between 2 and 2.5 lbs. 
     
     
         11 . The method according to  claim 9 , wherein the deposited coating has a thickness in the range of 100 nm to 1500 nm.