Method for initializing or removing contaminants from a deposition chamber and method of manufacturing the chamber

Abstract

The present disclosure relates to a method for initializing a deposition chamber, a method for removing contaminants in a deposition chamber, and a method of manufacturing a deposition chamber. In the method for initializing a deposition chamber, light is irradiated in the chamber, and then minute contaminants remaining in the chamber are removed. The newly manufactured chamber is thereby initialized so that it can be used for deposition.

1 . A method of initializing a chamber, or removing contaminants from the chamber, in order to use the chamber for deposition, wherein the chamber has been newly manufactured by mechanical assembly, the method comprising:
 electrolytically cleaning the newly manufactured chamber;   cleaning the electrolytically cleaned chamber with a solvent;   arranging a light source in the cleaned chamber;   irradiating light in the chamber from the light source; and   discharging gas in the chamber out of the chamber.   
     
     
         2 . The method as claimed in  claim 1 , wherein the solvent comprises at least one of water and alcohol. 
     
     
         3 . The method as claimed in  claim 1 , wherein irradiating the light in the chamber and discharging the gas in the chamber out of the chamber are simultaneously performed. 
     
     
         4 . The method as claimed in  claim 1 , wherein, discharging the gas in the chamber out of the chamber is performed before irradiating the light in the chamber. 
     
     
         5 . The method as claimed in  claim 1 , wherein light is irradiated in the chamber for about 1 to about 120 hours. 
     
     
         6 . The method as claimed in  claim 1 , wherein, while irradiating the light in the chamber, the gas in the chamber is continuously discharged out of the chamber. 
     
     
         7 . The method as claimed in  claim 1 , wherein the light generated by the light source comprises at least one of visible light and infrared light. 
     
     
         8 . The method as claimed in  claim 1 , wherein the light source comprises a halogen lamp. 
     
     
         9 . The method as claimed in  claim 1 , wherein the light source is arranged at one or more of corner parts and a space in the chamber. 
     
     
         10 . The method as claimed in  claim 1 , wherein an area, onto which the light is irradiated by the light source, comprises at least one of an inner wall of the chamber and structures in the chamber. 
     
     
         11 . The method as claimed in  claim 1 , wherein a temperature of a surface, onto which the light is irradiated, rises up to about 70 to about 200° C. 
     
     
         12 . The method as claimed in  claim 1 , wherein the gas in the chamber, which is discharged out of the chamber by the vacuum pump, comprises at least one of HNO3 and H2SO4. 
     
     
         13 . The method as claimed in  claim 1 , which further comprises arranging a light blocking cover at a part of structures in the chamber in order to prevent the light from being irradiated onto the part. 
     
     
         14 . The method as claimed in  claim 1 , wherein the chamber is a chamber applied to a process for depositing an organic material during manufacture of an organic light emitting device (OLED). 
     
     
         15 . The method as claimed in  claim 1 , wherein the gas in the chamber is discharged by operating a vacuum pump. 
     
     
         16 . The method as claimed in  claim 15 , wherein the vacuum pump has a capacity with which a pressure equal to or smaller than about 10 Pa is formed in the chamber. 
     
     
         17 . A method of manufacturing a chamber for depositing an organic material of an organic light emitting device (OLED), the method comprising:
 forming a chamber through mechanical assembling; and   removing contaminants in the chamber by the method as claimed in  claim 1 .