System for forming superconductor material on a tape substrate

Abstract

There is disclosed a system for forming a superconductor material on a substrate. The system may comprise a dispensing reel; a spooling reel; and at least two modular reaction chambers, wherein at least one modular reaction chamber is connected to a supply of buffer precursor material and at least one other modular reaction chamber is connected to a supply of superconductor precursor material. The modular reaction chambers may include connections capable of being modified to add or remove adjacent components. It is understood that at least one of the spooling reel and/or the dispensing reel are exposed to normal atmosphere. The deposition chamber may also comprise a distribution head that provides a laminar flow of precursor materials onto the substrate, as well as at least one lamp comprising a reflector that directs UV and/or visible light towards the tape substrate to enhance a growth rate of material.

1 - 9 . (canceled) 
     
     
         10 . A system for forming a superconductor material on a tape substrate, the system comprising:
 a dispensing reel;   a spooling reel; and   at least two modular reaction chambers, wherein at least one modular reaction chamber is connected to a supply of buffer precursor material and at least one other modular reaction chamber is connected to a supply of superconductor precursor material, wherein the at least two modular reaction chambers include connections capable of being modified to add or remove adjacent components; and   wherein the spooling reel and the dispensing reel are exposed to normal atmosphere.   
     
     
         11 . The system of  claim 10 , further comprising:
 a pre-clean stage to remove oil-based contaminants from the tape substrate, wherein the pre-clean stage comprises   a vapor treatment, a mechanical treatment, a bath treatment, or a combination thereof.   
     
     
         12 . The system of  claim 10 , further comprising:
 an initialization stage comprising at least one reducing material for treating the tape substrate prior to delivery to the modular reaction chambers.   
     
     
         13 . The system of  claim 10 , wherein each modular reaction chamber comprises: a heating element that heats the tape substrate. 
     
     
         14 . The system of  claim 13 , wherein the heating element comprises a lamp housing with a length dimension parallel to the path of the tape substrate such that light from the lamp housing is directed to the path of the tape substrate. 
     
     
         15 . The system of  10 , wherein each modular reaction chamber comprises:
 at least one distribution head to provide a laminar flow of material to form the layer of superconductor material on the tape substrate, wherein the distribution head has a length dimension parallel to a path of the tape substrate and wherein the distribution head is positioned over the path of the tape substrate.   
     
     
         16 . The system of  claim 15 , wherein the length dimension of the at least one distribution head is parallel to the length dimension of the heating element, wherein the shape of the heating element is substantially a half-pipe, and wherein the distribution head bisects the width of the heating element. 
     
     
         17 . The system of  claim 10 , further comprising:
 at least one transition chamber that isolates at least one of the modular reaction chambers from at least one other modular reaction chamber.   
     
     
         18 . The system of  claim 17 , wherein the at least one transition chamber comprises a vacuum system. 
     
     
         19 . The system of  claim 10 , further comprising an anneal stage between the at least two modular reactors and the spooling reel, wherein the anneal stage has an atmosphere that allows for increasing the oxygen stoichiometry in the layer of superconducting material on the substrate tape. 
     
     
         20 . (canceled) 
     
     
         21 . A system for forming a superconductor wire with a tape substrate, the system comprising:
 a device for moving a continuous tape substrate through a deposition system;   a device for forming at least one buffer layer on the tape substrate;   a device for forming at least one layer of superconductor material on the at least one buffer layer to form the superconductor wire; and   a device for spooling the tape substrate with the at least one buffer layer and the at least one layer of superconductor material in normal atmosphere, wherein the spooling means are exposed to normal atmosphere.   
     
     
         22 . The system of  claim 21 , wherein the tape substrate is at least one kilometer in length and the superconductor wire is continuous. 
     
     
         23 . The system of  claim 21 , further comprising a process controller for monitoring the tape substrate. 
     
     
         24 . The system of  claim 23 , wherein the process controller comprises at least one environmental sensor, at least one speed sensor, at least one temperature sensor, or any combination thereof. 
     
     
         25 . The system of  claim 21 , further comprising a device for maintaining the tape substrate at a predetermined temperature while providing a non-reactive atmosphere. 
     
     
         26 . The system of  claim 21 , wherein the tape substrate is longer than one-half kilometer. 
     
     
         27 . (canceled) 
     
     
         28 . The system of  claim 21 , further comprising a device for providing a protecting layer to the superconductor wire. 
     
     
         29 . The system of  claim 21 , further comprising a device for controlling a concentration of materials in the deposition system and/or means for controlling at least one of pressure and temperature in the deposition system. 
     
     
         30 - 34 . (canceled) 
     
     
         35 . A system for forming a superconductor wire on a tape substrate, the system comprising:
 a first reel under ambient conditions that dispenses the tape substrate;   at least one deposition chamber that receives the tape substrate from the first reel, wherein the first reel is outside the at least one deposition chamber, the at least one deposition chamber comprising:
 at least one distribution head that provides a laminar flow of precursor materials onto the tape substrate; and 
 at least one lamp comprising a reflector that directs UV and/or visible light towards the tape substrate to enhance a growth rate of material on the tape substrate surface; 
   at least one precursor system to inject at least one precursor material into the deposition chamber;   at least one transition chamber comprising at least one heating element to adjust the temperature of the tape substrate; and   a second reel under ambient conditions outside the at least one deposition chamber and the at least one transition chamber that spools the tape substrate comprising the layer of superconductor material.   
     
     
         36 . The system of  claim 35 , further comprising at least one stage chosen from:
 a pre-clean stage that removes oil-based contaminants from the tape substrate.   an initialization stage that pre-treats and/or pre-heats the tape substrate to delivery to the at least one deposition chamber.