US2012321740A1PendingUtilityA1

Pneumatic method and apparatus for nano imprint lithography having a conforming mask

Assignee: COLBURN MATTHEW EPriority: Nov 16, 2004Filed: Aug 30, 2012Published: Dec 20, 2012

Est. expiryNov 16, 2024(expired)· nominal 20-yr term from priority

Inventors:Matthew E. Colburn Yves Martin Theodore G. Van Kessel Hematha K. Wickramasinghe

H10P 76/204B29C 43/3642G03F 7/0002B29C 2043/025B29C 43/003B29C 2043/3647B82Y 10/00B29C 43/021B29C 2043/3649B82Y 40/00

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Abstract

An apparatus for nano lithography includes a mask having a pattern formed thereon and a pneumatic pressure driving source for applying a pneumatic pressure to at least one of a surface of the mask and a surface of a workpiece, thereby to uniformly transfer the pattern from the mask to the workpiece.

Claims

exact text as granted — not AI-modified

1 . An apparatus for nano lithography, comprising:
 a mask having a pattern formed thereon; and   a pneumatic pressure driving source for applying a pneumatic pressure to at least one of a surface of the mask and a surface of a workpiece, thereby to uniformly transfer the pattern from the mask to the workpiece.   
     
     
         2 . The apparatus according to  claim 1 , wherein said mask is transparent to radiation for exposing a photoresist formed on said workpiece, thereby allowing said radiation to pass through said mask and cure said photoresist. 
     
     
         3 . An apparatus for nano lithography, comprising:
 a mask having a pattern formed thereon; and   means for applying a pneumatic pressure to at least one of a surface of a mask and a surface of a workpiece, to transfer the pattern from the mask to the workpiece.

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