US2013063821A1PendingUtilityA1
Photonic crystal structure, method of manufacturing the photonic crystal structure, reflective color filter, and display apparatus employing the photonic crystal structure
Est. expirySep 9, 2031(~5.1 yrs left)· nominal 20-yr term from priority
G02F 1/1335C23C 14/081C23C 14/34C23C 14/10G02B 1/005G02B 5/285C23C 14/083G02B 5/201B82Y 40/00C23C 14/0652B82Y 30/00G02B 5/0221C23C 14/087B82B 1/00G02B 5/0294G02B 5/0284C23C 14/0694
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Claims
Abstract
A photonic crystal structure includes a nano structure layer including a plurality of nano particles of various sizes, and a photonic crystal layer on the nano structure layer. The plurality of nano particles are spaced apart from each other. The photonic crystal layer has a non-planar surface, and is configured to reflect light of a particular wavelength.
Claims
exact text as granted — not AI-modified1 . A photonic crystal structure comprising:
a nano structure layer including a plurality of nano particles of various sizes, the plurality of nano particles spaced apart from each other; and a photonic crystal layer on the nano structure layer, the photonic crystal layer having a non-planar surface and configured to reflect light having a particular wavelength.
2 . The photonic crystal structure of claim 1 , wherein the nano structure layer has a monolayer structure of the plurality of nano particles.
3 . The photonic crystal structure of claim 1 , wherein the photonic crystal layer comprises a first material layer and a second material layer alternately deposited on the nano structure layer, the first material layer having a first refractive index and the second material layer having a second refractive index different from the first refractive index.
4 . The photonic crystal structure of claim 3 , wherein the first material layer and the second material layer are formed of transparent insulating materials.
5 . The photonic crystal structure of claim 3 , wherein the first material layer and the second material layer are one of SiO 2 , TiO 2 , Si 3 N 4 , CaF 2 , LiF, and Mg F 2 .
6 . The photonic crystal structure of claim 3 , wherein one of the first material layer and the second material layer is formed of an insulating material, and the other one of the first material layer and the second material layer is formed of a metal material.
7 . The photonic crystal structure of claim 1 , wherein the plurality of nano particles of the nano structure layer are one of silica (SiO 2 ), alumina (Al 2 O 2 ), titania (TiO 2 ), zirconia (ZrO 2 ), yttria-zirconia (Y 2 O 3 —ZrO 2 ), copper oxide (CuO, Cu 2 O), and tantalum oxide (Ta 2 O 5 ).
8 . A method of manufacturing a photonic crystal structure, the method comprising:
forming a nano structure layer on a substrate, the nano structure layer including a plurality of nano particles of various sizes spaced apart from each other; and forming a photonic crystal layer on the nano structure layer, the photonic crystal layer having a non-planar surface and configured to reflect light having a particular wavelength.
9 . The method of claim 8 , wherein the forming a nano structure layer comprises:
forming a plurality of core-shell type particles on the substrate; reflowing materials of shells of the plurality of core-shell type particles using a baking process to expose materials of cores of the plurality of core-shell type particles; and etching the reflowed materials of the shells.
10 . The method of claim 9 , wherein the forming a plurality of core-shell type particles forms the plurality of core-shell type particles in a monolayer structure.
11 . The method of claim 9 , wherein the cores of the plurality of core-shell type particles are formed of inorganic materials, and the shells of the plurality of core-shell type particles are formed of organic materials.
12 . The method of claim 8 , wherein the forming a photonic crystal layer includes alternately depositing a first material layer and a second material layer, the first material layer having a first refractive index and the second material layer having a second refractive index different from the first refractive index.
13 . The method of claim 12 , wherein the alternately depositing a first material layer and a second material layer includes a deposition process using a sputter.
14 . The method of claim 13 , wherein sputter deposition conditions include a mean of a distance before target particles collide of about 10 cm or more, and a distance between a target and the substrate of about 10 cm or less.
15 . A reflective color filter comprising:
a plurality of first color units including the photonic crystal structure of claim 1 , the photonic crystal layer configured to reflect light of a first wavelength; a plurality of second color units including the photonic crystal structure of claim 1 , the photonic crystal layer configured to reflect light of a second wavelength; and a plurality of third color units including the photonic crystal structure of claim 1 , the photonic crystal layer configured to reflect light of a third wavelength, wherein the plurality of first color units, second color units, and third color units are alternately arranged in a two-dimensional array.
16 . The reflective color filter of claim 15 , wherein the nano structure layer has a monolayer structure of the plurality of nano particles.
17 . The reflective color filter of claim 15 , wherein the photonic crystal layer comprises a first material layer and a second material layer alternately deposited on the nano structure layer, the first material layer having a first refractive index and the second material layer having a second refractive index different from the first refractive index.
18 . The reflective color filter of claim 17 , wherein the first material layer and the second material layer are formed of transparent insulating materials.
19 . The reflective color filter of claim 15 , wherein the first material layer and the second material layer are one of SiO 2 , TiO 2 , Si 3 N 4 , CaF 2 , LiF, and MgF 2 .
20 . The reflective color filter of claim 15 , wherein one of the first material layer and the second material layer is formed of an insulating material, and the other of the first material layer and the second material layer is formed of a metal material.
21 . The reflective color filter of claim 15 , wherein the plurality of nano particles of the nano structure layer are one of silica (SiO 2 ), alumina (Al 2 O 2 ), titania (TiO 2 ), zirconia (ZrO 2 ), yttria-zirconia (Y 2 O 3 —ZrO 2 ), copper oxide (CuO, Cu 2 O), and tantalum oxide (Ta 2 O 5 ).
22 . A display apparatus comprising:
the reflective color filter of claim 15 ; and a display panel including regions corresponding to the plurality of first color units, the plurality of second color units, and the plurality of third color units, the display panel modulating light incident to the regions according to image information.
23 . The display apparatus of claim 22 , wherein the display panel includes one of a liquid crystal display device, an electrophoresis display device, an electrowetting display device, and an electrochromic display device.
24 . The display apparatus of claim 22 , further comprising: an absorption unit corresponding with the display panel, the absorption unit configured to absorb light passing through the reflective color filter.Join the waitlist — get patent alerts
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