US2013087448A1PendingUtilityA1
Apparatus for manufacturing template and method for manufacturing template
Est. expiryOct 6, 2031(~5.2 yrs left)· nominal 20-yr term from priority
Inventors:Tetsuo Takemoto
H01J 2237/3341H01J 37/32834H01J 37/32568H01J 37/32715H01J 37/32082B82B 3/0076B82B 1/001H01J 37/3211H10P 76/2041
51
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Claims
Abstract
According to one embodiment, an apparatus for manufacturing a template includes a vacuum chamber, an electrode and an adjustor. The vacuum chamber includes an inlet and an exhaust port of a reactive gas. The vacuum chamber is capable of maintaining an atmosphere depressurized below atmospheric pressure. The electrode is provided in an interior of the vacuum chamber. A high frequency voltage is applied to the electrode. A substrate is placed on the electrode. The substrate has a back surface on a side of the electrode. A recess is provided in the back surface. The adjustor is inserted into the recess. The adjustor is insulative.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . An apparatus for manufacturing a template, comprising:
a vacuum chamber including an inlet and an exhaust port of a reactive gas, the vacuum chamber being capable of maintaining an atmosphere depressurized below an atmospheric pressure; an electrode provided in an interior of the vacuum chamber, a high frequency voltage being applied to the electrode, a substrate being placed on the electrode, the substrate having a back surface on a side of the electrode, a recess being provided in the back surface; and an adjustor being configured to be inserted into the recess, the adjustor being insulative.
2 . The apparatus according to claim 1 , wherein a side surface of the adjustor conforms to an inner surface of the recess.
3 . The apparatus according to claim 1 , wherein the adjustor is formed of a same material as the substrate.
4 . The apparatus according to claim 1 , wherein the adjustor includes SiO 2 .
5 . The apparatus according to claim 1 , wherein the adjustor includes quartz including TiO 2 .
6 . The apparatus according to claim 1 , further comprising a guide plate provided in a peripheral portion of an upper surface of the electrode to guide the substrate, the guide plate being insulative.
7 . The apparatus according to claim 6 , wherein the guide plate is formed of a same material as the adjustor.
8 . The apparatus according to claim 6 , wherein the guide plate includes SiO 2 .
9 . The apparatus according to claim 6 , wherein the guide plate includes quartz including TiO 2 .
10 . The apparatus according to claim 6 , wherein the guide plate has a step-like portion having a difference in levels.
11 . The apparatus according to claim 10 , wherein the difference in levels is not less than 0.15 mm and not more than 0.20 mm.
12 . The apparatus according to claim 1 , wherein the adjustor is provided in a plurality, and the plurality of adjustors are inserted into the recess.
13 . The apparatus according to claim 1 , wherein a configuration of the adjustor when projected onto a plane parallel to an upper surface of the electrode is a dot configuration arranged two-dimensionally in the plane.
14 . The apparatus according to claim 1 , wherein an upper surface of the adjustor is separated from a bottom surface of the recess.
15 . The apparatus according to claim 1 , further comprising an inductively coupled plasma high frequency coil additionally provided in the vacuum chamber above the electrode.
16 . The apparatus according to claim 1 , wherein the reactive gas includes at least one selected from a fluorine-based gas and an oxygen gas.
17 . A method for manufacturing a template, comprising:
disposing a substrate used to form a template on an electrode with a back surface of the substrate opposing the electrode, a high frequency voltage being applied to the electrode, the substrate having a patterning surface on a front surface and a recess in the back surface; and performing dry etching of the patterning surface in a state in which an adjustor is inserted into an interior of the recess, the adjustor being insulative.
18 . The method according to claim 17 , wherein a side surface of the adjustor conforms to an inner surface of the recess.
19 . The method according to claim 17 , wherein the adjustor is formed of a same material as the substrate.
20 . The method according to claim 17 , wherein a resist layer having a prescribed pattern configuration is provided on the patterning surface of the substrate.Cited by (0)
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