Apparatus for manufacturing mold for nanoimprinting and method of manufacturing mold for nanoimprinting
Abstract
An apparatus for manufacturing a mold for nanoimprinting and a method of manufacturing a mold for nanoimprinting are provided. The apparatus for manufacturing the mold for nanoimprinting performs an anodic oxidation treatment to an aluminum substrate with an electrolytic solution and is characterized in that at least a material of a surface of a portion contacting with the electrolytic solution is a metal or an alloy thereof, having an eluted amount of 0.2 ppm/cm 2 or less per unit area when immersed in 80 ml of the electrolytic solution at room temperature for 450 hours. The method of manufacturing the mold for nanoimprinting is characterized in using the apparatus for manufacturing the mold for nanoimprinting to carry out the anodic oxidation treatment. The manufacturing apparatus and manufacturing method of the invention suppress metal elution into the electrolytic solution during the anodic oxidation treatment.
Claims
exact text as granted — not AI-modified1 . An apparatus for manufacturing a mold for nanoimprinting, which performs an anodic oxidation treatment to an aluminum substrate in an electrolytic solution, and is characterized in that at least a material of a surface of a portion in contact with the electrolytic solution is a metal of the following criteria or an alloy of the metal of the following criteria:
an eluted amount of the metal per unit area when immersed in 80 mL of the electrolytic solution for 450 hours at room temperature is 0.2 ppm/cm 2 or less.
2 . The apparatus of claim 1 , wherein the electrolytic solution is oxalic acid.
3 . The apparatus of claim 2 , wherein the material of the surface of the portion in contact with the electrolytic solution is zirconium or an alloy thereof.
4 . The apparatus of claim 2 , wherein the material of the surface of the portion in contact with the electrolytic solution is tantalum or an alloy thereof
5 . The apparatus of claim 1 , wherein the electrolytic solution is sulfuric acid.
6 . The apparatus of claim 5 , wherein the material of the surface of the portion in contact with the electrolytic solution is niobium or an alloy thereof
7 . The apparatus of claim 5 , wherein the material of the surface of the portion in contact with the electrolytic solution is tantalum or an alloy thereof
8 . A method of manufacturing a mold for nanoimprinting, which comprises performing an anodic oxidation treatment to an aluminum substrate in an electrolytic solution to form a porous structure on a surface of the mold by using an apparatus for manufacturing a mold for nanoimprinting to perform the anodic oxidation treatment, wherein at least a material of a surface of a portion of the apparatus in contact with the electrolytic solution is a metal of the following criteria or an alloy of the metal of the following criteria:
an eluted amount of the metal per unit area when immersed in 80 mL of the electrolytic solution for 450 hours at room temperature is 0.2 ppm/cm 2 or less.
9 . The method of claim 8 , wherein the electrolytic solution is oxalic acid.
10 . The method of claim 9 , wherein the material of the surface of the portion in contact with the electrolytic solution is zirconium or an alloy thereof.
11 . The method of claim 9 , wherein the material of the surface of the portion in contact with the electrolytic solution is tantalum or an alloy thereof.
12 . The method of claim 8 , wherein the electrolytic solution is sulfuric acid.
13 . The method of claim 12 , wherein the material of the surface of the portion in contact with the electrolytic solution is niobium or an alloy thereof.
14 . The method of claim 12 , wherein the material of the surface of the portion in contact with the electrolytic solution is tantalum or an alloy thereof.Cited by (0)
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