US2013112567A1PendingUtilityA1

Apparatus for manufacturing mold for nanoimprinting and method of manufacturing mold for nanoimprinting

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Assignee: OZAWA SATORUPriority: Jul 26, 2010Filed: Jul 21, 2011Published: May 9, 2013
Est. expiryJul 26, 2030(~4 yrs left)· nominal 20-yr term from priority
B29C 33/424G02B 27/0006C25D 11/005C25D 11/10B29C 59/02C25D 11/08C25D 17/02C25D 1/006B29C 33/38G02B 1/118C25D 17/00
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Claims

Abstract

An apparatus for manufacturing a mold for nanoimprinting and a method of manufacturing a mold for nanoimprinting are provided. The apparatus for manufacturing the mold for nanoimprinting performs an anodic oxidation treatment to an aluminum substrate with an electrolytic solution and is characterized in that at least a material of a surface of a portion contacting with the electrolytic solution is a metal or an alloy thereof, having an eluted amount of 0.2 ppm/cm 2 or less per unit area when immersed in 80 ml of the electrolytic solution at room temperature for 450 hours. The method of manufacturing the mold for nanoimprinting is characterized in using the apparatus for manufacturing the mold for nanoimprinting to carry out the anodic oxidation treatment. The manufacturing apparatus and manufacturing method of the invention suppress metal elution into the electrolytic solution during the anodic oxidation treatment.

Claims

exact text as granted — not AI-modified
1 . An apparatus for manufacturing a mold for nanoimprinting, which performs an anodic oxidation treatment to an aluminum substrate in an electrolytic solution, and is characterized in that at least a material of a surface of a portion in contact with the electrolytic solution is a metal of the following criteria or an alloy of the metal of the following criteria:
 an eluted amount of the metal per unit area when immersed in 80 mL of the electrolytic solution for 450 hours at room temperature is 0.2 ppm/cm 2  or less.   
     
     
         2 . The apparatus of  claim 1 , wherein the electrolytic solution is oxalic acid. 
     
     
         3 . The apparatus of  claim 2 , wherein the material of the surface of the portion in contact with the electrolytic solution is zirconium or an alloy thereof. 
     
     
         4 . The apparatus of  claim 2 , wherein the material of the surface of the portion in contact with the electrolytic solution is tantalum or an alloy thereof 
     
     
         5 . The apparatus of  claim 1 , wherein the electrolytic solution is sulfuric acid. 
     
     
         6 . The apparatus of  claim 5 , wherein the material of the surface of the portion in contact with the electrolytic solution is niobium or an alloy thereof 
     
     
         7 . The apparatus of  claim 5 , wherein the material of the surface of the portion in contact with the electrolytic solution is tantalum or an alloy thereof 
     
     
         8 . A method of manufacturing a mold for nanoimprinting, which comprises performing an anodic oxidation treatment to an aluminum substrate in an electrolytic solution to form a porous structure on a surface of the mold by using an apparatus for manufacturing a mold for nanoimprinting to perform the anodic oxidation treatment, wherein at least a material of a surface of a portion of the apparatus in contact with the electrolytic solution is a metal of the following criteria or an alloy of the metal of the following criteria:
 an eluted amount of the metal per unit area when immersed in 80 mL of the electrolytic solution for 450 hours at room temperature is 0.2 ppm/cm 2  or less.   
     
     
         9 . The method of  claim 8 , wherein the electrolytic solution is oxalic acid. 
     
     
         10 . The method of  claim 9 , wherein the material of the surface of the portion in contact with the electrolytic solution is zirconium or an alloy thereof. 
     
     
         11 . The method of  claim 9 , wherein the material of the surface of the portion in contact with the electrolytic solution is tantalum or an alloy thereof. 
     
     
         12 . The method of  claim 8 , wherein the electrolytic solution is sulfuric acid. 
     
     
         13 . The method of  claim 12 , wherein the material of the surface of the portion in contact with the electrolytic solution is niobium or an alloy thereof. 
     
     
         14 . The method of  claim 12 , wherein the material of the surface of the portion in contact with the electrolytic solution is tantalum or an alloy thereof.

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