Metal Complex Compositions and Methods for Making Metal-Containing Films

Abstract

The present invention provides compositions of matter useful as deposition agents for making structures, including thin film structures and hard coatings, on substrates and features of substrates. In an embodiment, for example, the present invention provides metal complexes having one or more diboranamide or diboranaphosphide ligands that are useful as chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) precusors for making thin film structures and coatings. Metal complex CVD precursors are provided that possess volitilities sufficiently high so as to provide dense, smooth and homogenous thin films and coatings.

1 - 55 . (canceled) 
     
     
         56 . A composition of matter comprising a metal complex having the formula:
   M(B 3 H 8 ) x D y   (F29)
   wherein M is a metal atom selected from the group consisting of: Be, Mg, Ca, Sr, Ba, Ra, Al, Ga, In, Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Mo, W, Mn, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Hg, Dy, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Ho, Er, Tm, Yb, Lu, Ac, Th, Pa, U, Np, Pu, Am, and Cm;   wherein each D, independent of other D, is a neutral coordinating ligand;   wherein x is the oxidation state of M; and   wherein y is 0, 1, 2, 3 or 4.   
     
     
         57 . The composition of  claim 56  wherein M is Mg and x is 2. 
     
     
         58 . The composition of  claim 56  wherein x is 1, 2, 3, or 4. 
     
     
         59 . The composition of  claim 56  wherein D is selected from the group consisting of: alkenes (R 3 R 4 C═CR 5 R 6 ), alkynes (R 3 C≡CR 4 ), ethers (R 3 OR 4 ), sulfides (R 3 SR 4 ), amines (R 3 NR 4 R 5 ), nitriles (R 3 CN), isonitriles (R 3 NC), phosphines (R 3 PR 4 R 5 ), phosphites ((R 30 )P(OR 4 ) (OR 5 )), arsines (R 3 AsR 4 R 5 ), and stibenes (R 3 SbR 4 R 5 ); wherein R 3 , R 4 , R 5  and R 6  are functional groups independently selected from the group consisting of hydrogen, alkyl, fluoroalkyl, aryl, alkenyl, alkynyl, and trialkylsilyl. 
     
     
         60 . The composition of  claim 56  wherein D is selected from the group consisting of: cyclic monoethers, linear polyethers, cyclic polyethers, cyclic monoamines, linear polyamines, cyclic polyamines, cyclic monophosphines, linear polyphosphines, cyclic polyphosphines, cyclic monoalkenes, linear polyenes, linear dienes, linear trienes, linear tetraenes, cyclic polyenes, cyclic dienes, cyclic trienes, cyclic tetraenes, cyclic monoalkynes and cyclic dialkynes. 
     
     
         61 . The composition of  claim 56  wherein D is selected from the group consisting of tetrahydrofuran, 1,2-dimethoxyethane, diethylether, and dimethyl ether. 
     
     
         62 . The composition of  claim 56  having a formula selected from the group consisting of: Mg(B 3 H 8 ) 2 , Mg(B 3 H 8 ) 2 (Et 2 O) 2 , and Mg(B 3 H 8 ) 2 (Me 2 O) 2 . 
     
     
         63 - 65 . (canceled)