Cosmetic process for making-up and/or caring for the skin and/or the lips

Abstract

A cosmetic process for making up and/or caring for skin and/or lips, includes the application to skin and/or lips of a cosmetic composition including, in a physiologically acceptable medium, at least one supramolecular polymer and at least one hydrophobic film-forming polymer. Particular compositions may be used in the process.

1 . A cosmetic process for making up and/or caring for skin and/or lips, comprising at least application to the skin and/or the lips of a cosmetic composition comprising, in a physiologically acceptable medium:
 at least one supramolecular polymer based on functionalized polyalkene of formula HO—P—OH in which P represents a homopolymer or a copolymer that may be obtained by polymerization of one or more linear, cyclic and/or branched polyunsaturated C 2 -C 10 , which may be derived from a reaction of the functionalized polyalkene polymer with at least one junction group functionalized with at least one reactive group capable of reacting with reactive group(s) of the functionalized polyalkene polymer, the junction group being capable of forming at least 3H (hydrogen) bonds; and   at least one hydrophobic film-forming polymer.   
     
     
         2 . The process according to  claim 1 , wherein the functionalized polyalkene of formula HO—P—OH is hydrogenated. 
     
     
         3 . The process according to  claim 1 , wherein P represents a homo- or copolymer that may be obtained by polymerization of one or more linear and/or branched, C 2 -C 4  diunsaturated alkenes. 
     
     
         4 . The process according to  claim 1 , wherein P represents a polybutylene, a polybutadiene, a polyisoprene, a poly(1,3-pentadiene) or a polyisobutylene, and copolymers thereof. 
     
     
         5 . The process according to  claim 1 , wherein the functionalized junction group is of formula: 
       
         
           
           
               
               
           
         
       
       in which L represents a saturated or unsaturated C 1 -C 20  divalent carbon-based group. 
     
     
         6 . The process according to  claim 1 , wherein the supramolecular polymer corresponds to the formula: 
       
         
           
           
               
               
           
         
       
       in which:
 L′ and L″ are, independently of each other, saturated or unsaturated C 1 -C 20  divalent carbon-based group; and 
 X, X′═O. 
 
     
     
         7 . The process according to  claim 6 , wherein:
 L′ and L″ are both isophorone groups,   P represents a polybutylene, a polybutadiene, a polyisoprene, a poly(1,3-pentadiene) or a polyisobutylene, and copolymers thereof.   
     
     
         8 . The process according to  claim 1 , the composition comprising from 0.1% to 60% by weight of supramolecular polymer solids relative to the total weight of the composition. 
     
     
         9 . The process according to  claim 1 , wherein the hydrophobic film-forming polymer is chosen from polyamide silicone block polymers, block ethylenic polymers, vinyl polymers comprising at least one carbosiloxane dendrimer derivative, copolymers comprising carboxylate groups and polydimethylsiloxane groups, silicone resins and lipodispersible polymers in the form of a non-aqueous dispersion of polymer particles, and mixtures thereof. 
     
     
         10 . The process according to  claim 9 , wherein the hydrophobic film-forming polymer is at least one polyamide silicone block copolymer comprising at least one unit of formula (III) or (IV): 
       
         
           
           
               
               
           
         
       
       in which:
 1) R 4 , R 5 , R 6  and R 7 , which may be identical or different, represent a group chosen from:
 linear, branched or cyclic, saturated or unsaturated, C 1  to C 40  hydrocarbon-based groups, possibly containing in their chain one or more oxygen, sulfur and/or nitrogen atoms, and possibly being partially or totally substituted with fluorine atoms, 
 C 6 -C 10  aryl groups, optionally substituted with one or more C 1 -C 4  alkyl groups, 
 polyorganosiloxane chains possibly containing one or more oxygen, sulfur and/or nitrogen atoms: 
 
 2) the groups X, which may be identical or different, represent a linear or branched C 1 -C 30  alkylenediyl group, possibly containing in its chain one or more oxygen and/or nitrogen atoms; 
 3) Y is a saturated or unsaturated C 1  to C 50  linear or branched alkylene, arylene, cycloalkylene, alkylarylene or arylalkylene divalent group, which may comprise one or more oxygen, sulfur and/or nitrogen atoms, and/or may bear as substituent one of the following atoms or groups of atoms: fluorine, hydroxyl, C 3  to C 8  cycloalkyl, C 1  to C 40  alkyl, C 5  to C 10  aryl, phenyl optionally substituted with 1 to 3 C 1  to C 3  alkyl, C 1  to C 3  hydroxyalkyl and C 1  to C 6  aminoalkyl groups, or 
 4) Y represents a group corresponding to the formula: 
 
       
         
           
           
               
               
           
         
       
       in which:
 T represents a linear or branched, saturated or unsaturated, C 3 -C 24  trivalent or tetravalent hydrocarbon-based group optionally substituted with a polyorganosiloxane chain, and possibly containing one or more atoms chosen from O, N and S, or T represents a trivalent atom chosen from N, P and Al, and 
 R 8  represents a linear or branched C 1 -C 50  alkyl group or a polyorganosiloxane chain, possibly comprising one or more ester, amide, urethane, thiocarbamate, urea, thiourea and/or sulfonamide groups, which may possibly be linked to another chain of the polymer; and 
 5) n is an integer ranging from 2 to 500 and m is an integer ranging from 50 to 1000. 
 
     
     
         11 . The process according to  claim 1 , wherein the hydrophobic film-forming polymer is at least one lipodispersible polymer in the form of a non-aqueous dispersion of polymer particles. 
     
     
         12 . The process according to  claim 1 , wherein the hydrophobic film-forming polymer is at least one silicone resin. 
     
     
         13 . The process according to  claim 1 , wherein the hydrophobic film-forming polymer is at least one block ethylenic copolymer containing at least a first block with a glass transition temperature (Tg) of greater than or equal to 40° C. and being totally or partly derived from one or more first monomers, which are such that a homopolymer prepared from the first monomers has a glass transition temperature of greater than or equal to 40° C., and at least a second block with a glass transition temperature of less than or equal to 20° C. and being derived totally or partly from one or more second monomers, which are such that a second homopolymer prepared from the second monomers has a glass transition temperature of less than or equal to 20° C., the first block and the second block being connected together via a statistical intermediate segment comprising at least one of the first constituent monomers of the first block and at least one of the second constituent monomers of the second block, and the block copolymer having a polydispersity index I of greater than 2. 
     
     
         14 . The process as claimed in  claim 13 , wherein the block ethylenic copolymer is such that the first block is obtained from at least one acrylate monomer of formula CH 2 ═CH—COOR 2  in which R 2  represents a C 4  to C 12  cycloalkyl group and from at least one methacrylate monomer of formula CH 2 ═C(CH 3 )—COOR′ 2  in which R′ 2  represents a C 4  to C 12  cycloalkyl group, and the second block being obtained from at least a second monomer with a glass transition temperature of less than or equal to 20° C. and from an additional monomer. 
     
     
         15 . The process according to  claim 1 , wherein the hydrophobic film-forming polymer is at least one vinyl polymer bearing at least one carbosiloxane dendrimer-based unit and is the product of polymerization of:
 (A) 0 to 99.9 parts by weight of a vinyl monomer; and   (B) 100 to 0.1 part by weight of a carbosiloxane dendrimer containing a radical-polymerizable organic group, represented by the formula:   
       
         
           
           
               
               
           
         
       
       in which Y represents a radical-polymerizable organic group, R 1  represents an aryl group or an alkyl group containing from 1 to 10 carbon atoms, and X 1  represents a silylalkyl group which, when i=1, is represented by the formula: 
       
         
           
           
               
               
           
         
       
       in which R 1  is the same as defined above, R 2  represents an alkylene group containing from 2 to 10 carbon atoms, R 3  represents an alkyl group containing from 1 to 10 carbon atoms, X i+1  represents a hydrogen atom, an alkyl group containing from 1 to 10 carbon atoms, an aryl group, or the silylalkyl group defined above with i=i+1; i is an integer from 1 to 10 that represents the generation of the said silylalkyl group, and ai is an integer from 0 to 3; in which the said radical-polymerizable organic group Y contained in components (B) is chosen from the group formed by an organic group that contains a methacrylic group or an acrylic group and that is represented by the formulae: 
       
         
           
           
               
               
           
         
       
       in which R 4  represents a hydrogen atom or an alkyl group, R 5  represents an alkylene group containing from 1 to 10 carbon atoms; and 
       an organic groups containing a styryl group and that is represented by the formula: 
       
         
           
           
               
               
           
         
       
       in which R 6  represents a hydrogen atom or an alkyl group, R 7  represents an alkyl group containing from 1 to 10 carbon atoms, R 8  represents an alkylene group containing from 1 to carbon atoms, b is an integer from 0 to 4, and c is 0 or 1, such that if c is 0, —(R 8 ) c — represents a bond. 
     
     
         16 . The process according to  claim 15 , wherein the vinyl polymer bearing at least one carbosiloxane dendrimer-based unit is an acrylate/polytrimethyl siloxymethacrylate copolymer. 
     
     
         17 . The process according to  claim 1 , wherein the hydrophobic film-forming polymer is a copolymer comprising carboxylate groups and polydimethylsiloxane groups. 
     
     
         18 . A composition for making up and/or caring for skin and/or lips, comprising, in a physiologically acceptable medium, at least one supramolecular polymer, at least one hydrophobic film-forming polymer and at least one pigment different from a nacre and from black iron oxide. 
     
     
         19 . A composition for making up and/or caring for skin and/or lips, comprising, in a physiologically acceptable medium, at least one supramolecular polymer, at least one hydrophobic film-forming polymer and at least 1% by weight relative to the total weight of the composition of at least one organic or inorganic filler. 
     
     
         20 . A composition for making up and/or caring for skin and/or lips, comprising, in a physiologically acceptable medium, at least one supramolecular polymer, at least one hydrophobic film-forming polymer and at least 4.5% by weight of ethanol relative to the total weight of the composition. 
     
     
         21 . (canceled) 
     
     
         22 . The process according to Claim  5 , wherein L is chosen from a linear or branched C 1 -C 20  alkylene; a C 5 -C 20  (alkyl)cycloalkylene, an alkylene-biscycloalkylene and a C 6 -C 20  (alkyl)arylene. 
     
     
         23 . The process according to Claim  1 , wherein the said hydrophobic film-forming polymer is chosen from copolymers of acrylic acid and of stearyl acrylate containing polydimethylsiloxane grafts, copolymers of stearyl methacrylate containing polydimethylsiloxane grafts, copolymers of acrylic acid and of stearyl methacrylate containing polydimethylsiloxane grafts, copolymers of methyl methacrylate, butyl methacrylate, 2-ethylhexylacrylate and stearyl methacrylate containing polydimethylsiloxane grafts. 
     
     
         24 . The composition according to  claim 18 , wherein the supramolecular polymer is based on functionalized polyalkene of formula HO—P—OH in which P represents a homopolymer or a copolymer that may be obtained by polymerization of one or more linear, cyclic and/or branched polyunsaturated C 2 -C 10  alkenes, which may be derived from a reaction of the functionalized polyalkene polymer with at least one junction group functionalized with at least one reactive group capable of reacting with reactive group(s) of the functionalized polyalkene polymer, the junction group being capable of forming at least 3H (hydrogen) bonds. 
     
     
         25 . The composition according to  claim 18 , wherein the hydrophobic film-forming polymer is chosen from polyamide silicone block polymers, block ethylenic polymers, vinyl polymers comprising at least one carbosiloxane dendrimer derivative, copolymers comprising carboxylate groups and polydimethylsiloxane groups, silicone resins and lipodispersible polymers in the form of a non-aqueous dispersion of polymer particles, and mixtures thereof. 
     
     
         26 . The composition according to  claim 19 , wherein the supramolecular polymer is based on functionalized polyalkene of formula HO—P—OH in which P represents a homopolymer or a copolymer that may be obtained by polymerization of one or more linear, cyclic and/or branched polyunsaturated C 2 -C 10  alkenes, which may be derived from a reaction of the functionalized polyalkene polymer with at least one junction group functionalized with at least one reactive group capable of reacting with reactive group(s) of the functionalized polyalkene polymer, the junction group being capable of forming at least 3H (hydrogen) bonds. 
     
     
         27 . The composition according to  claim 19 , wherein the hydrophobic film-forming polymer is chosen from polyamide silicone block polymers, block ethylenic polymers, vinyl polymers comprising at least one carbosiloxane dendrimer derivative, copolymers comprising carboxylate groups and polydimethylsiloxane groups, silicone resins and lipodispersible polymers in the form of a non-aqueous dispersion of polymer particles, and mixtures thereof. 
     
     
         28 . The composition according to  claim 20 , wherein the supramolecular polymer is based on functionalized polyalkene of formula HO—P—OH in which P represents a homopolymer or a copolymer that may be obtained by polymerization of one or more linear, cyclic and/or branched polyunsaturated C2-C10 alkenes, which may be derived from a reaction of the functionalized polyalkene polymer with at least one junction group functionalized with at least one reactive group capable of reacting with reactive group(s) of the functionalized polyalkene polymer, the junction group being capable of forming at least 3H (hydrogen) bonds. 
     
     
         29 . The composition according to  claim 20 , wherein the hydrophobic film-forming polymer is chosen from polyamide silicone block polymers, block ethylenic polymers, vinyl polymers comprising at least one carbosiloxane dendrimer derivative, copolymers comprising carboxylate groups and polydimethylsiloxane groups, silicone resins and lipodispersible polymers in the form of a non-aqueous dispersion of polymer particles, and mixtures thereof.