US2013213805A1PendingUtilityA1

Target utilization improvement for rotatable magnetrons

53
Individually held — no corporate assignee on recordPriority: Apr 2, 2010Filed: Feb 13, 2013Published: Aug 22, 2013
Est. expiryApr 2, 2030(~3.7 yrs left)· nominal 20-yr term from priority
Inventors:Dennis R. Hollars
H01J 37/3405H01J 37/3458C23C 14/35H01J 37/3452C23C 14/3407
53
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

Rotatable magnetron sputtering apparatuses are described for depositing material from a target while reducing premature burn through issues. The rotatable magnetron sputtering apparatus includes electric coils wound on pole pieces to modulate the magnetic fields at the ends of the magnetron magnetic assembly. Changing the direction of electric current moves the sputtering region alternately around its normal central position to decrease the rate of erosion depth at the ends of the target material.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A magnetic assembly for use in a cylindrical rotatable magnetron, comprising;
 a first magnet disposed toward a central portion of the magnetic assembly, the first magnet having a first magnetic orientation;   a second magnet disposed toward an outer portion of the magnetic assembly, the second magnet having a second magnetic orientation that is opposite to the first magnetic orientation; and   one or more electromagnetic coils between the first and second magnets, the one or more electromagnetic coils wound around one or more pole pieces, the one or more electromagnetic coils configured to provide a magnetic field having a third magnetic orientation that is parallel to one of the first and second magnetic orientations and opposite to the other of the first and second magnetic orientations.   
     
     
         2 . The magnetic assembly of  claim 1 , wherein the one or more electromagnetic coils are disposed at end portions of the magnetic assembly. 
     
     
         3 . The magnetic assembly of  claim 1 , wherein the one or more electromagnetic coils are arranged in an approximately curved fashion along a sputtering path at each end of the magnetic assembly. 
     
     
         4 . The magnetic assembly of  claim 1 , wherein the first and third magnetic orientations are parallel. 
     
     
         5 . The magnetic assembly of  claim 1 , wherein the second and third magnetic orientations are parallel. 
     
     
         6 . The magnetic assembly of  claim 1 , wherein the first magnet comprises a plurality of magnets. 
     
     
         7 . The magnetic assembly of  claim 1 , wherein the second magnet comprises a plurality of magnets. 
     
     
         8 . The magnetic assembly of  claim 1 , further comprising one or more magnetic field-shaping pole pieces disposed on top of the one or more pole pieces. 
     
     
         9 . The magnetic assembly of  claim 1 , wherein one or more of the first and second magnets are permanent magnets. 
     
     
         10 . The magnetic assembly of  claim 1 , wherein the second magnet circumscribes at least a portion of the first magnet. 
     
     
         11 . The magnetic assembly of  claim 1 , wherein the first magnet has a length that is larger than a width of the first magnet. 
     
     
         12 . The magnetic assembly of  claim 1 , wherein the second magnet has a length that is larger than a width of the second magnet. 
     
     
         13 . The magnetic assembly of  claim 1 , wherein the magnetic assembly comprises 5 or more electromagnetic coils at each end of the magnetic assembly. 
     
     
         14 . A cylindrical rotatable magnetron sputtering apparatus, comprising:
 a magnetic assembly having one or more electromagnetic coils between a first magnet and a second magnet, the one or more electromagnetic coils configured to provide a magnetic field having a magnetic orientation that is parallel to the magnetic orientation of one of the first and second magnets and opposite the magnetic orientation of the other of the first and second magnets;   one or more insulated wires in electric contact with the one or more electromagnetic coils, the one or more insulated wires configured to provide electric current to the one or more electromagnetic coils; and   a backing tube for housing the magnetic assembly, the backing tube configured to hold a target material,   wherein the backing tube is configured to rotate while the magnetic assembly remains stationary.   
     
     
         15 . A cylindrical rotatable magnetron sputtering device, comprising:
 a magnetic assembly having a first set of electromagnetic coils and a second set of electromagnetic coils, each of the first and second sets of electromagnetic coils disposed between a first magnet and a second magnet, each of the first and second sets of electromagnetic coils configured to provide a magnetic field having a magnetic orientation that is parallel to the magnetic orientation of one of the first and second magnets and opposite the magnetic orientation of the other of the first and second magnets;   one or more insulated wires in electric contact with the first and second sets of electromagnetic coils, the one or more insulated wires configured to provide electric current to each of the first and second sets of electromagnetic coils; and   a backing tube for housing the magnetic assembly, the backing tube configured to hold a target material.   
     
     
         16 . The cylindrical rotatable magnetron sputtering device of  claim 15 , wherein the backing tube is configured to rotate while the magnetic assembly remains stationary. 
     
     
         17 . The cylindrical rotatable magnetron sputtering device of  claim 15 , further comprising a plurality of insulated wires, wherein a first subset of the plurality of insulated wires is in electric contact with the first set of electromagnetic coils, and wherein a second subset of the plurality of insulated wires is in electric contact with the second set of electromagnetic coils. 
     
     
         18 . The cylindrical rotatable magnetron sputtering device of  claim 17 , wherein each of the first subset and the second subset of the plurality of insulated wires is in electric contact with a separate power supply. 
     
     
         19 . The cylindrical rotatable magnetron sputtering device of  claim 15 , wherein the one or more insulated wires include a pair of wires separately connected in parallel to the first and second sets of electromagnetic coils. 
     
     
         20 . The cylindrical rotatable magnetron sputtering device of  claim 15 , wherein the one or more insulated wires include pairs of wires, each of the pairs of wires being connected to one of the first set and second set of electromagnetic coils. 
     
     
         21 . The cylindrical rotatable magnetron sputtering device of  claim 20 , wherein each of the pairs of wires is in electric contact with a separate power supply.

Join the waitlist — get patent alerts

Track US2013213805A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.