US2013236727A1PendingUtilityA1

Method for attaching nanoparticles to substrate particles

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Assignee: ETH ZURICH ETH TRANSFERPriority: Sep 27, 2005Filed: Apr 30, 2013Published: Sep 12, 2013
Est. expirySep 27, 2025(expired)· nominal 20-yr term from priority
B01J 19/088A61K 47/26Y10T428/2998Y10T428/2991B01J 2219/0883C23C 26/00C23C 16/4417B01J 2219/0869
36
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Claims

Abstract

The invention relates to the deposition of nanoparticles from the gas phase of the a thermal plasma of a gas discharge and the subsequent attachment of said nanoparticles to the substrate particles. The invention can be used for increasing the flowability of solid bulk material. Particularly the pharmaceutical industry utilizes numerous intermediate and final products in the form of powders which cause processing problems because of the poor flowability thereof. With fine-grained materials, undesired adhesive effects occur foremost because of Van der Waals' forces. Said effects can be reduced by applying nanoparticles to the surface of the material that is to be treated. The invention is characterized by a combined process in which the nanoparticles are produced and are attached to the substrate surface. Using a non-thermal plasma additionally makes it possible to treat temperature-sensitive materials that are often used in the pharmaceutical industry.

Claims

exact text as granted — not AI-modified
1 . A method for forming nanoparticles and their attachment to substrate particles, wherein
 a gas stream is guided through a plasma zone in which an electric gas discharge is used to produce an anisothermal plasma to produce free charge carriers and excited neutral species,   wherein a gaseous monomer, which serves as starting material for the chemical reaction for the formation of the nanoparticles, is added to the gas stream before or in said plasma zone, and   wherein the free charge carriers and excited neutral species are used directly in the plasma zone to bring the gaseous monomer into a chemically reactive state and to a homogeneous chemical reaction, so that nanoparticles form from the gas phase owing to chemical deposition,   wherein the formed nanoparticles attach to the surface of the substrate particles due to the collision of said substrate particles with said formed nanoparticles in a treatment zone through which a substrate particle stream or a gas/substrate particle stream is guided under the influence of at least one of said gas stream and a gravitational force in said treatment zone,   wherein the monomer is fed in in a gas flow, with a content, based on the system pressure, in the range from 2-10%.   
     
     
         2 . The method as claimed in  claim 1 , wherein in a gas/substrate particle stream under the influence of the gas stream and the gravitational force, the substrate particles are guided through said treatment zone, wherein the gas stream includes, in addition to the substrate particles, a gaseous monomer which serves as starting material for the chemical reaction for forming the nanoparticles; wherein an electric gas discharge is used in said treatment zone in order to produce an anisothermal plasma as the plasma zone, wherein the free electrons, or, respectively, the charge carriers and the excited neutral species, are used to bring the gaseous monomer into a chemically reactive state and to a homogeneous chemical reaction, with the result that nanoparticles form due to chemical deposition from the gas phase; and wherein the formed nanoparticles attach directly to the surface of the substrate particles due to the collision of the two types of particles inside the plasma zone. 
     
     
         3 . The method as claimed in  claim 1 , wherein plasma zone and treatment zone physically coincide or wherein the treatment zone is situated substantially directly downstream of the plasma zone, where in the latter case the gas stream from the plasma zone and the substrate particle stream intersect. 
     
     
         4 . The method as claimed in  claim 1 , wherein the substrate particles are guided once through the treatment zone, and wherein the treatment zone is a drop tube or an ascending tube. 
     
     
         5 . The method as claimed in  claim 13 , wherein the substrate particles reside in the treatment zone, wherein the treatment zone is a drum reactor or a fluidized bed. 
     
     
         6 . The method as claimed in  claim 1 , wherein the solid particles are guided through the treatment zone a number of times, e.g. periodically, and wherein the treatment zone is an ascending tube of circulating fluidized bed. 
     
     
         7 . The method as claimed in  claim 1 , wherein the substrate particles and the gas stream are fed in at different locations in the reactor. 
     
     
         8 . The method as claimed in  claim 1 , wherein a fluid monomer is used, in the form of an aerosol. 
     
     
         9 . The method as claimed in  claim 1 , wherein the chemical reaction proceeds via a number of reaction stages. 
     
     
         10 . The method as claimed in  claim 1 , wherein the nanoparticles collide among each other and agglomerate before they attach to the substrate surface and/or wherein the nanoparticles on the substrate surface collide with other nanoparticles and agglomerate. 
     
     
         11 . The method as claimed in  claim 1 , wherein the free nanoparticles which are not yet attached are coated by heterogeneous chemical deposition from the gas phase and/or wherein the nanoparticles which are already attached to the substrate surface are coated by heterogeneous chemical deposition from the gas phase. 
     
     
         12 . The method as claimed in  claim 1 , wherein the substrate surface which is not yet loaded or only to a negligible degree by nanoparticles is also coated by heterogeneous chemical deposition from the gas phase, and/or wherein the substrate surface is coated exclusively by heterogeneous chemical deposition from the gas phase. 
     
     
         13 . The method as claimed in  claim 1 , wherein a microwave coupling, medium or radio frequency coupling or DC excitation is used to produce an electric gas discharge. 
     
     
         14 . The method as claimed in  claim 1 , wherein the monomer is HDMSO or a mixture containing HDMSO. 
     
     
         15 . The method as claimed in  claim 1 , wherein an anisothermal low-pressure plasma or a normal-pressure plasma is present in the plasma zone. 
     
     
         16 . The method as claimed in  1 , wherein the low-pressure plasma is operated at a pressure in the range from 0.27 mbar to 2.7 mbar. 
     
     
         17 . The method as claimed in  claim 1 , wherein the monomer is fed in in a gas stream, in an inert gas stream, with a content, based on the system pressure, in the range from 2-5%. 
     
     
         18 . The method as claimed in  claim 1 , wherein substrate particles with an average size in the range from 500 nm-500 μm, or in the range from 5 μm-500 μm, are introduced into the process, wherein the substrate particles are electrically conducting or electrically non-conducting. 
     
     
         19 . The method as claimed in  claim 1 , wherein the substrate particles are particles which are stable up to a temperature of at least 70° C., wherein they are pharmaceutically active components. 
     
     
         20 . The method as claimed in  claim 1 , wherein the nanoparticles have an average size in the range of less than 500 nm or a range from 0.5 nm-0.5 μm, and wherein the lower limit of the size of the nanoparticles is given by the corresponding molecule size of the substance deposited in the process. 
     
     
         21 . The method as claimed in  claim 1 , wherein the average residence time accumulated in the case of periodic operation in the treatment zone lies in the range from 10 ms-1 s. 
     
     
         22 . Method as claimed in  claim 1  for increasing the flowability of substrate particles. 
     
     
         23 . An apparatus for carrying out a method as claimed in  claim 1 , wherein a plasma zone is present through which a gas stream is guided and in which an electric gas discharge is used to produce an anisothermal plasma, to produce free charge carriers and excited neutral species,
 wherein a gaseous monomer, which serves as starting material for the chemical reaction for the formation of the nanoparticles, is added to the gas stream before or in said plasma zone,   wherein the free charge carriers and excited neutral species are used directly in the plasma zone to bring the gaseous monomer into a chemically reactive state and to a homogeneous chemical reaction, so that nanoparticles form from the gas phase owing to chemical deposition,   wherein a treatment zone is present through which a substrate particle or substrate particle/gas stream is guided under the influence of at least one of said gas stream or a gravitational force, and in which the formed nanoparticles attach to the surface of the substrate particles due to the collision of said substrate particles with said formed nanoparticles   and wherein means are provided for feeding the monomer in in a gas flow, with a content, based on the system pressure, in the range from 2-10%.   
     
     
         24 . The apparatus as claimed in  claim 1 , wherein a first guiding element is arranged, in the form of a tube, in which the substrate particles are guided in the sense of a drop tube or of an ascending tube and wherein a second guiding element, which is arranged substantially at right angles to the first guiding element and opens into this first guiding element, is present, in which second guiding element the gas stream with the monomers is guided and in which second tube the anisothermal plasma zone is arranged such that substantially directly after this plasma zone, the nanoparticles, which are formed there, in the gas stream attach to the surface of the substrate particles by way of the collision of the two types of particles in the treatment zone. 
     
     
         25 . The apparatus as claimed in  claim 1 , wherein the described process is integrated in an apparatus, in a jet mill. 
     
     
         26 . The apparatus as claimed in  claim 1 , wherein plasma zone and treatment zone physically coincide or wherein the treatment zone is situated substantially directly downstream of the plasma zone, where in the latter case the gas stream from the plasma zone and the substrate particle stream intersect. 
     
     
         27 . A substrate particle which can be produce or is produced, according to a method as claimed in  claims 1 .

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