Apparatus and methods for deposition reactors

Abstract

An apparatus, such as an ALD (Atomic Layer Deposition) apparatus, including a precursor source configured for depositing material on a heated substrate in a deposition reactor by sequential self-saturating surface reactions. The apparatus includes an in-feed line for feeding precursor vapor from the precursor source to a reaction chamber and a structure configured for utilizing heat from a reaction chamber heater for preventing condensation of precursor vapor into liquid or solid phase between the precursor source and the reaction chamber. Also various other apparatus and methods are presented.

1 - 25 . (canceled) 
     
     
         26 . A precursor source comprising:
 a detachably attachable precursor cartridge;   a first fitting configured for attaching and detaching the precursor cartridge to and from the precursor source; and   a second fitting for attaching and detaching the precursor source to and from the deposition reactor device.   
     
     
         27 . The precursor source of claim  1 , comprising:
 a particle filter in connection with the first fitting.   
     
     
         28 . The precursor source of claim  1 , comprising:
 a sealing part or valve configured for sealing the precursor cartridge to prevent precursor material flow from inside the precursor cartridge to the first fitting.   
     
     
         29 . The precursor source of claim  3 , comprising:
 a third fitting on a first side of the sealing part or valve; and   a fourth fitting on another side of the sealing part or valve, wherein   said third and fourth fittings are configured to open for detaching said sealing part or valve and for cleaning the cartridge.   
     
     
         30 . The precursor source of claim  1 , comprising a thermally conductive source body and therein a heater cartridge. 
     
     
         31 . The precursor source of claim  5 , comprising a heat insulator layer around the source body, and a cover around the heat insulator layer. 
     
     
         32 . The precursor source of claim  1 , comprising a thermally conductive protrusion with a machined channel for a thermocouple near the bottom of the precursor cartridge. 
     
     
         33 . The precursor source of claim  1 , wherein the precursor cartridge comprises a manual cartridge valve configured to seal the precursor cartridge. 
     
     
         34 . A detachably attachable precursor cartridge for use in the precursor source of claim  1 . 
     
     
         35 . The precursor cartridge of claim  9 , comprising a precursor chamber housing a precursor reservoir configured to hold the precursor. 
     
     
         36 . The precursor cartridge of claim  10 , wherein the precursor chamber comprises a neck fitting for disassembling the precursor cartridge for cleaning. 
     
     
         37 . The precursor cartridge of claim  9 , wherein the precursor reservoir's wall is sealed with a seal against the precursor chamber. 
     
     
         38 . The precursor cartridge of claim  9 , comprising a fitting for loading and unloading the precursor reservoir from the bottom of the cartridge. 
     
     
         39 . The precursor cartridge of claim  13 , comprising a downwards protruding handle for pulling the reservoir out of the precursor chamber after opening the fitting. 
     
     
         40 . The precursor cartridge of claim  10 , comprising a valve configured to isolate the gas space of the precursor chamber from a source outlet conduit. 
     
     
         41 . The precursor cartridge of claim  10 , wherein the precursor reservoir comprises a particle filter on top of the precursor reservoir.