Templated Monolayer Polymerization and Replication

Abstract

A self-replicating monolayer system employing polymerization of monomers or nanoparticle ensembles on a defined template provides synthesis of two-dimensional single molecule polymers. Systems of self-replicating monolayers are used as templates for growth of inorganic colloids. A preferred embodiment employs SAM-based replication, wherein an initial monolayer is patterned and used as a template for self-assembly of a second monolayer by molecular recognition. The second monolayer is polymerized in place and the monolayers are separated to form a replicate. Both may then function as templates for monolayer assemblies. A generic self-replicating monomer unit comprises a polymerizable moiety attached by methylene repeats to a recognition element and an ending unit that will not interfere with the chosen recognition chemistry. The recognition element is self-complementary, unless two replicating monomers with compatible cross-linking chemistry are employed. After replication, selective mineralization and/or electroless plating may produce a two-dimensional inorganic sheet having patterned domains within it.

What is claimed is: 
     
         1 . A method for replicating a two-dimensional patterned structure comprising the steps of:
 binding a plurality of monomer units having crosslinker arms to a template of the two-dimensional patterned structure;   reacting the crosslinker arms to bind the monomer units to each other to form a replicated two-dimensional patterned structure; and   disassociating the replicated two-dimensional patterned structure from the template.   
     
     
         2 . The method of  claim 1 , further including the step of selective mineralization of the replicated two-dimensional patterned structure. 
     
     
         3 . The method of  claim 1 , further including the step of electroless plating of the replicated two-dimensional patterned structure. 
     
     
         4 . The method of  claim 1 , further including the steps of nanoparticle adhesion to, and sintering of, the replicated two-dimensional patterned structure. 
     
     
         5 . The method of  claim 1 , further including the step of growing an inorganic structure upon the replicated two-dimensional patterned structure. 
     
     
         6 . The method of  claim 5 , wherein the inorganic structure is a semiconductor. 
     
     
         7 . The method of  claim 1 , further including the step of binding a plurality of inorganic materials to the replicated two-dimensional patterned structure. 
     
     
         8 . The method of  claim 7 , wherein at least one of the inorganic materials is metallic. 
     
     
         9 . The method of  claim 1 , wherein the monomers are nucleotides, oligonucleotides, or amino acids. 
     
     
         10 . The method of  claim 1 , wherein the monomers are nanoparticle ensembles. 
     
     
         11 . The method of  claim 1 , wherein the monomers are selected from the group consisting of Hentriaconta-11,13,20,22-tetraynoic acid, Hentriaconta-11,13,20,22-tetraynoic acid amide, Triaconta-10,12,19,21-tetraynoic acid amide, and Triaconta-10,12,19,21-tetraynoic acid.