US2013340815A1PendingUtilityA1
Electrode and method of forming the same and electronic device including the same
Est. expiryJun 26, 2032(~5.9 yrs left)· nominal 20-yr term from priority
H10F 77/211C23C 28/02H01B 1/026Y02E10/50C25D 7/126C25D 3/38C22C 1/02H01B 5/14H01B 13/00H01B 1/02Y10T428/12063C23C 28/027H01L 31/022425
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Claims
Abstract
An electrode including a first layer having a sintered product of a metallic glass and a first conductive material, and a second layer including a second conductive material plated using the first layer as a seed layer, a method of manufacturing the same, and an electronic device including the electrode.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . An electrode comprising:
a first layer comprising a sintered product of a metallic glass and a first conductive material; and a second layer comprising a second conductive material plated using the first layer as a seed layer.
2 . The electrode of claim 1 , wherein the first conductive material comprises a metal having resistivity of less than about 15 μΩcm.
3 . The electrode of claim 2 , wherein the first conductive material comprises silver, aluminum, copper, nickel, titanium, an alloy thereof, or a combination thereof.
4 . The electrode of claim 1 , wherein the second conductive material comprises a metal having resistivity of less than about 100 μΩcm.
5 . The electrode of claim 4 , wherein the second conductive material comprises copper, nickel, tin, titanium, aluminum, an alloy thereof, or a combination thereof.
6 . The electrode of claim 1 , wherein the first conductive material comprises silver or a silver alloy, and
the second conductive material comprises copper or a copper alloy.
7 . The electrode of claim 1 , wherein the metallic glass has a glass transition temperature of about 50° C. to about 800° C.
8 . The electrode of claim 1 , wherein the metallic glass comprises an aluminum-based metallic glass, a copper-based metallic glass, a nickel-based metallic glass, a titanium-based metallic glass, a tin-based metallic glass, a cerium-based metallic glass, a strontium-based metallic glass, a gold-based metallic glass, a ytterbium-based metallic glass, a zinc-based metallic glass, a calcium-based metallic glass, a magnesium-based metallic glass, a platinum-based metallic glass, a zirconium-based metallic glass, an iron-based metallic glass, or a combination thereof.
9 . The electrode of claim 1 , wherein the second layer is thicker than the first layer.
10 . The electrode of claim 9 , wherein the first layer has a thickness of about 0.1 micrometers to about 50 micrometers, and
the second layer has a thickness of about 0.2 micrometers to about 100 micrometers.
11 . A method of manufacturing an electrode, comprising:
applying a conductive paste comprising a first conductive material and a metallic glass on a substrate to provide a first layer; and plating a second conductive material using the first layer as a seed layer to provide a second layer.
12 . A method of claim 11 , wherein the providing a first layer comprises:
applying the conductive paste on the substrate; and firing the conductive paste.
13 . The method of claim 11 , wherein the plating of a second conductive material comprises wet plating using a plating solution.
14 . The method of claim 13 , wherein the plating solution is a basic plating solution.
15 . The method of claim 13 , wherein the plating solution is an acidic plating solution.
16 . The method of claim 15 , further comprising providing a buffer layer on the substrate before providing a first layer.
17 . An electronic device comprising the electrode according to claim 1 .
18 . The electronic device of claim 17 , further comprising a buffer layer positioned between the first layer of the electrode and a substrate.
19 . The electronic device of claim 18 , wherein the buffer layer comprises polyimide.
20 . The electronic device of claim 17 , wherein the electronic device is a solar cell.Join the waitlist — get patent alerts
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