Hard coating layer and method for forming the same

Abstract

The present invention relates to hard coating layer and a method for forming the hard coating layer. A method for forming hard coating layer which comprises: washing a substrate; installing the washed substrate in a vacuum equipment, and vacuating the chamber of the vacuum equipment; cleaning the substrate; forming oblique coating layer on the substrate; and forming vertical coating layer, vertically to the substrate, on the oblique coating layer by applying bias-voltage after forming oblique coating layer is provided. According to present invention, hardness of coating layer may be enhanced by forming a oblique coating layer and vertical coating layer on a substrate.

What is claimed is: 
     
         1 . A method for forming hard coating layer which comprises:
 washing a substrate;   installing the washed substrate in a vacuum equipment, and vacuating the chamber of the vacuum equipment;   cleaning the substrate;   forming oblique coating layer on the substrate; and   forming vertical coating layer, vertically to the substrate, on the oblique coating layer by applying bias-voltage after forming oblique coating layer.   
     
     
         2 . The method of  claim 1 , wherein the oblique coating layer and the vertical coating layer are formed in multiple layers. 
     
     
         3 . The method of  claim 1 , wherein oblique directions of the oblique coating layer are changed at opposite directions at least two times. 
     
     
         4 . The method of  claim 1 , wherein the oblique coating layer and the vertical coating layer are comprised of titanium-nitride (TiN). 
     
     
         5 . The method of  claim 1 , wherein the substrate is washed by ultra-sonic wave with alcohol and acetone. 
     
     
         6 . The method of  claim 1 , wherein the degrees of vacuum in the chamber of the vacuum equipment is equal to or lower than 10 −6  torr. 
     
     
         7 . The method of  claim 1 , wherein formation of oblique and vertical coating layer is performed in degrees of vacuum between 2×10 −2  torr and 2×10 −4  torr by injecting argon gas in the vacuum equipment. 
     
     
         8 . The method of  claim 1 , wherein oblique angle is between 10° and 80°. 
     
     
         9 . The method of  claim 1 , wherein the bias-voltage is applied below 200V.