US2014014032A1PendingUtilityA1

Device for producing stoichiometry gradients and layer systems

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Assignee: ARDENNE ANLAGENTECH GMBHPriority: Aug 25, 2009Filed: Sep 13, 2013Published: Jan 16, 2014
Est. expiryAug 25, 2029(~3.1 yrs left)· nominal 20-yr term from priority
Inventors:Harald GrossCarsten Deus
C23C 14/24C23C 14/00C23C 14/548C23C 14/12
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Claims

Abstract

A process and a device for coating substrates with a stoichiometric gradient in an in-line coating system include at least two evaporation devices, each with an evaporator tube. The evaporator tubes are implemented so as to be tiltable independently of one another, whereby the transition area of the two vapor lobes can be adapted to the requirements of the gradient profile. Furthermore, the spacing of the evaporator tubes from the substrate and each other can be set.

Claims

exact text as granted — not AI-modified
1 - 10 . (canceled) 
     
     
         11 . Device for coating a substrate in an in-line vacuum coating system comprising: at least two evaporation devices for heating and evaporating materials to be deposited and producing a mixed single layer of evaporated material from the at least two evaporation deviced on a substrate, each device comprising a respective evaporator tube having an opening for introducing evaporated material into the vacuum coating system, means for adjusting spacing of at least one respective evaporator tube from the substrate and means for setting an angle of vapor entry direction of at least one respective evaporator tube in relation to the substrate independently of an angle of vapor entry direction of another respective evaporator tube. 
     
     
         12 . Device according to  claim 11 , wherein the angle of vapor entry direction in relation to the substrate is implemented so that it can be set within a range of +90°<x<−90°. 
     
     
         13 . Device according to  claim 11 , wherein the opening in at least one evaporator tube comprises a nozzle. 
     
     
         14 . Device according to  claim 11 , wherein the opening in at least one evaporator tube comprises a slot. 
     
     
         15 . Device according to  claim 11 , wherein, in front of the opening in at least one respective evaporator tube, a baffle is disposed in a direction towards the substrate. 
     
     
         16 . Device according to  claim 11 , further comprising baffles disposed in front of the substrate. 
     
     
         17 . Device according to  claims 16 , wherein the baffles are implemented in such a manner that they can be heated.

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