US2014014501A1PendingUtilityA1
Dual Absorber Electrodes
Est. expiryJul 16, 2032(~6 yrs left)· nominal 20-yr term from priority
C25B 11/051C25B 1/04C25B 11/059C25B 1/55C25B 9/73C25B 11/00Y02E60/36C25B 11/0405C25B 1/10C25B 1/003
49
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
Dual absorber electrodes are disclosed. In some embodiments, a dual absorber electrode includes a first absorber material, such as silicon, having a first bandgap, and a second absorber material, such as hematite, deposited on a surface of the first absorber material, the second absorber material having a second bandgap larger than the first bandgap of the first absorber. In some embodiments, the dual absorber electrodes of the present embodiment may be utilized in an electrolytic cell for water splitting.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A dual absorber electrode comprising a first absorber material having a first bandgap; and a second absorber material deposited on a surface of the first absorber material, the second absorber material having a second bandgap larger than the first bandgap of the first absorber.
2 . The electrode of claim 1 wherein the first absorber material is a silicon nanostructure and the second absorber material is a hematite thin film deposited on the surface of the silicon nanostructure.
3 . The electrode of claim 1 further comprising a uniform interface between the first absorber material and the second absorber material with low defect densities and low impurity levels.
4 . The electrode of claim 1 wherein the second absorber material is deposited over the first absorber material in a conformal fashion.
5 . The electrode of claim 1 wherein the second absorber material is a thin film conformally deposited on the surface of the first absorber material.
6 . The electrode of claim 1 wherein the first absorber material is a photovoltaic junction.
7 . The electrode of claim 1 wherein the second absorber material is a photovoltaic junction.
8 . The electrode of claim 1 further comprising a catalyzing member in electrical contact with the first absorber material for catalyzing hydrogen generation.
9 . The electrode of claim 8 wherein the first absorber material is a silicon nanostructure and the second absorber material is a hematite thin film deposited on the surface of the silicon nanostructure.
10 . The electrode of claim 8 wherein a uniform interface is formed between the first absorber material and the second absorber material with low defect densities and low impurity levels.
11 . The electrode of claim 8 wherein the second absorber material is a photovoltaic junction.
12 . A device for splitting water to generate hydrogen and oxygen comprising:
a first compartment having a first electrode, the electrode comprising a first absorber material having a first bandgap, and a second absorber material deposited on a surface of the first absorber material, the second absorber material having a second bandgap larger than the first bandgap of the first absorber; a second compartment having a second electrode for catalyzing hydrogen generation; and a semi-permeable membrane separating the first compartment and the second compartment.
13 . The device of claim 12 wherein the first absorber material is a silicon nanostructure and the second absorber material is a hematite thin film deposited on the surface of the silicon nanostructure.
14 . The device of claim 12 wherein a uniform interface is formed between the first absorber material and the second absorber material with low defect densities and low impurity levels.
15 . The device of claim 12 wherein the second absorber material is deposited over the first absorber material in a conformal fashion.
16 . The device of claim 12 wherein the second absorber material is a thin film conformally deposited on the surface of the first absorber material.
17 . The device of claim 12 wherein the first absorber material is a photovoltaic junction.
18 . The device of claim 12 wherein the second absorber material is a photovoltaic junction.
19 . A method of fabricating an electrode comprising:
obtaining a silicon nanostructure; forming by vapor deposition a layer of hematite on a surface of the silicon nanostructure by exposing the silicon nanostructure to gas precursors of hematite; and repeating the vapor-depositing to form additional layers of hematite on the surface of the silicon nanostructure.
20 . The method of claim 19 wherein the silicon nanostructure is a photovoltaic junction.Cited by (0)
No later patents cite this yet.
References (0)
No backward citations on record.