Successive gas hydrate manufacturing device

Abstract

Embodiments of the inventive concept provide a successive gas hydrate manufacturing device, without hydration after generating gas hydrate slurry, capable of operating with a higher conversion rate and relatively low hydrate generation pressure and reducing a product cost by decreasing the number of processing steps for removing heat of reaction, for which the total exothermic value downs due to no need of latent heat according to a phase change rather than the case of generating a gas hydrate directly from a water solution, as well as making gas diffusion easier during reaction of generation and maximizing a contact area between water and gas to increase a gas capture rate and shorten the total hydrate generation time.

1 . A successive gas hydrate manufacturing device comprising:
 a piped ice maker configured to inject potential hydrate crystals of a water solution, which include a surfactant, into a piped reactor; and   the piped reactor configure to react the injected potential hydrate crystals and a gas with each other to generate a gas hydrate and circularly transport the gas hydrate through the full length of the piped reactor to maximize a conversion rate.   
     
     
         2 . The successive gas hydrate manufacturing device according to  claim 1 , wherein the piped reactor comprises pig-balls configured to circularly transport the gas hydrate in the piped reactor while connected to each other with a constant interval in multiplicity. 
     
     
         3 . The successive gas hydrate manufacturing device according to  claim 2 , wherein a diameter of the pig-balls is conditioned to be close to a caliber of the piped reactor. 
     
     
         4 . The successive gas hydrate manufacturing device according to  claim 2 , wherein a multiplicity of the pig-balls adjacent to each other are arranged to be different in angle. 
     
     
         5 . The successive gas hydrate manufacturing device according to  claim 1 , wherein the potential hydrate crystals are porously structured. 
     
     
         6 . The successive gas hydrate manufacturing device according to  claim 5 , wherein the porous potential hydrate crystals are formed in ice particles of the water solution. 
     
     
         7 . The successive gas hydrate manufacturing device according to  claim 5 , wherein the porous potential hydrate crystals are formed in slurry of the water solution. 
     
     
         8 . The successive gas hydrate manufacturing device according to  claim 6 , wherein the potential hydrate crystals are made by cooling and smashing the water solution. 
     
     
         9 . The successive gas hydrate manufacturing device according to  claim 5 , wherein the porous potential hydrate crystals are made by impregnating a porous material in a water solution and cooling the impregnated porous material. 
     
     
         10 . The successive gas hydrate manufacturing device according to  claim 9 , wherein the porous material is adopted from active carbon, silica gel and zeolite. 
     
     
         11 . The successive gas hydrate manufacturing device according to  claim 5 , wherein the porous potential hydrate crystals are made by rendering a highly absorbent resin to absorb a water solution, which contains the surfactant, and cooling the highly absorbent resin in which the water solution is absorbed. 
     
     
         12 . The successive gas hydrate manufacturing device according to  claim 11 , wherein the highly absorbent resin is adopted from polyacrylate, polyacryl amide, polyacryl acid, polymethacylic acid, polyethylene oxide, and polyvinyl alcohol. 
     
     
         13 . The successive gas hydrate manufacturing device according to  claim 1 , wherein the surfactant is adopted from sodium dodecyl sulfate (SDS), diisooctyl sodium sulfosuccinate (DSS), sodium tetradecyl sulfate, sodium hexadecyl sulfate, sodium dodecylbenzene sulfonate, xylenesulfonate, sodium oleate, 4-n-decylbensenesulfonate, sodium laurate, 4-dodecylbenzenesulfonic acid, dodecylamine hydrochloride, dodecyltrimethylammonium chloride, 4-n-octylbenzenesulfonate, ethoxylated sulfonate, decylbenzenesulfonate, potassium oleate, n-decylbenzene sulfonate, alkyltrimethylammonium bromide (C10-C16 chains), dodecyl amine, tetradecyltrimethylammonium chloride, dodecyl polysaccharide glycoside, cyclodextrins, glycolipids, lipprotein-lipopeptides, para-toluene sulfonic acid, trisiloxane, triton X-100, and a mixture. 
     
     
         14 . The successive gas hydrate manufacturing device according to  claim 13 , wherein the volume of the surfactant is less than 0.5% of the total volume of the water solution. 
     
     
         15 . The successive gas hydrate manufacturing device according to  claim 13 , wherein the surfactant is ranged from 50 ppm to 1000 ppm in concentration. 
     
     
         16 . The successive gas hydrate manufacturing device according to  claim 1 , wherein the piped reactor is preliminarily cooled before injecting the potential hydrate crystals that contain the surfactant. 
     
     
         17 . The successive gas hydrate manufacturing device according to  claim 16 , wherein the piped reactor is ranged from −10° C. to 10° C. in cooling temperature. 
     
     
         18 . The successive gas hydrate manufacturing device according to  claim 1 , wherein the piped reactor is maintained with constant internal temperature by additional gas supply even after injecting a gas. 
     
     
         19 . The successive gas hydrate manufacturing device according to  claim 18 , wherein the piped reactor is ranged from 10 bars to 100 bars in internal pressure. 
     
     
         20 . The successive gas hydrate manufacturing device according to  claim 1 , wherein the gas injected into the piped reactor is adopted from methane, ethane, propane, carbon dioxide, butane, and a mixture. 
     
     
         21 . A successive gas hydrate manufacturing device comprising a piped reactor, which is lengthily formed, configured to generate a gas hydrate and circularly transport the gas hydrate through the full length to maximize a conversion rate. 
     
     
         22 . The successive gas hydrate manufacturing device according to  claim 21 , wherein the piped reactor comprises pig-balls configured to circularly transport the gas hydrate in the piped reactor while connected to each other with a constant interval in multiplicity. 
     
     
         23 . The successive gas hydrate manufacturing device according to  claim 22 , wherein a diameter of the pig-balls is conditioned to be close to a caliber of the piped reactor. 
     
     
         24 . The successive gas hydrate manufacturing device according to  claim 22 , wherein a multiplicity of the pig-balls adjacent to each other are arranged to be different in angle. 
     
     
         25 . The successive gas hydrate manufacturing device according to  claim 7 , wherein the potential hydrate crystals are made by cooling and smashing the water solution.