Processing method utilizing cluster

Abstract

A processing method having excellent processing performance at a low flow rate is provided. A method for processing a surface of a sample uses reactive clusters produced by adiabatic expansion of a gas mixture ejected from a nozzle into a vacuum processing chamber. The gas mixture contains a reactive gas chlorine trifluoride, a first inert gas argon, and a second inert gas xenon. The gas mixture in an inlet of the nozzle has a pressure of 0.4 MPa (abs) or more. The reactive gas constitutes 3% by volume or more and 10% by volume or less. The first inert gas constitutes 40% by volume or more and 94% by volume or less. The second inert gas constitutes 3% by volume or more and 50% by volume or less of the gas mixture.

What is claimed is: 
     
         1 . A method for processing a surface of a sample using reactive clusters produced by adiabatic expansion of a gas mixture ejected from a nozzle into a vacuum processing chamber, the gas mixture containing a reactive gas chlorine trifluoride, a first inert gas argon, and a second inert gas xenon, wherein
 the gas mixture in an inlet of the nozzle has a pressure of 0.4 MPa (abs) or more, the reactive gas constitutes 3% by volume or more and 10% by volume or less, the first inert gas constitutes 40% by volume or more and 94% by volume or less, and the second inert gas constitutes 3% by volume or more and 50% by volume or less of the gas mixture.   
     
     
         2 . The method according to  claim 1 , wherein the gas mixture in an inlet of the nozzle has a pressure of 0.6 MPa (abs) or more, the reactive gas constitutes 5% by volume or more and 7% by volume or less, the first inert gas constitutes 43% by volume or more and 89% by volume or less, and the second inert gas constitutes 6% by volume or more and 50% by volume or less of the gas mixture.