Methods for the implementation of nanocrystalline and amorphous metals and alloys as coatings

Abstract

Methods for the use of nanocrystalline or amorphous metals or alloys as coatings with industrial processes are provided. Three, specific, such methods have been detailed. One of the preferred embodiments provides a method for the high volume electrodeposition of many components with a nanocrystalline or amorphous metal or alloy, and the components produced thereby. Another preferred embodiment provides a method for application of a nanocrystalline or amorphous coatings in a continuous electrodeposition process and the product produced thereby. Another of the preferred embodiments of the present invention provides a method for reworking and/or rebuilding components and the components produced thereby.

1 - 20 . (canceled) 
     
     
         21 . A method of manufacturing a component, comprising:
 applying a nanocrystalline or amorphous material to a component, said component having at least one surface, wherein said nanocrystalline or amorphous material is applied to said component through an electrodeposition process, and wherein an electric potential exists on said component through an electrical contact with at least one other component.   
     
     
         22 . The method according to  claim 21 , wherein the electrodeposition process is tailored to produce a nanocrystalline material having a specific grain size. 
     
     
         23 . The method according to  claim 21 , wherein the electrodeposition process is tailored to apply a nanocrystalline or amorphous material with varying compositions or grain sizes. 
     
     
         24 . The method according to  claim 21 , wherein the nanocrystalline or amorphous material is an alloy comprising tungsten (W) and at least one other element. 
     
     
         25 . The method according to  claim 24 , wherein the electrodeposition process involves the application of a reverse pulsed current. 
     
     
         26 . The method according to  claim 21 , wherein the electrodeposition process uses a vessel to hold the component and the at least one other component. 
     
     
         27 . The method according to  claim 21 , wherein the electrodeposition process involves an electrical potential having periods of both positive polarity and negative polarity. 
     
     
         28 . The method according to  claim 21 , wherein the electrodeposition process involves an electrical potential that is pulsed more than once. 
     
     
         29 . The method according to  claim 21 , wherein the electrodeposition process involves the application of a reverse pulsed current. 
     
     
         30 . The method according to  claim 21 , wherein the electrical contact with the at least one other component is changing as a result of agitation of the component and the at least one other component. 
     
     
         31 . A product manufactured according to the process of  claim 21 . 
     
     
         32 . A method of manufacturing a component, comprising:
 applying a nanocrystalline or amorphous material to a component, wherein the nanocrystalline or amorphous material is applied through an electrodeposition process, said electrodeposition process comprised of a beginning portion of the component entering an electrodeposition bath before an adjoining portion of the component enters the electrodeposition bath and the beginning portion of the component also exiting the electrodeposition bath before the adjoining portion of the component exits the electrodeposition bath.   
     
     
         33 . The method according to  claim 32 , wherein the electrodeposition process is tailored to produce a nanocrystalline material having a specific grain size. 
     
     
         34 . the method according to  claim 32 , wherein the electrodeposition process is tailored to apply a nanocrystalline or amorphous material with varying compositions or grain sizes. 
     
     
         35 . The method according to  claim 32 , wherein the nanocrystalline or amorphous material is an alloy comprising tungsten (W) and at least one other element. 
     
     
         36 . The method according to  claim 35 , wherein the electrodeposition process involves the application of a reverse pulsed current. 
     
     
         37 . The method according to  claim 32 , wherein the electrodeposition process involves an electrical potential having periods of both positive polarity and negative polarity. 
     
     
         38 . The method according to  claim 32 , wherein the electrodeposition process involves an electrical potential that is pulsed more than once. 
     
     
         39 . The method according to  claim 32 , wherein the electrodeposition process involves the application of a reverse pulsed current. 
     
     
         40 . The method according to  claim 32 , wherein an electric potential exists on the component. 
     
     
         41 . A product manufactured according to the process of  claim 32 . 
     
     
         42 . A method of rebuilding a component, comprising:
 applying a nanocrystalline or amorphous material to at least one surface of a component, wherein said application of said nanocrystalline or amorphous material repairs damage to the at least one surface or brings a geometry of the at least one surface of the component to within a desired dimensional size.   
     
     
         43 . The method according to  claim 42 , wherein an electrodeposition process is used to apply the nanocrystalline or amorphous material to the at least one surface. 
     
     
         44 . The method according to  claim 42 , wherein the electrodeposition process is tailored to produce a nanocrystalline material having a specific grain size. 
     
     
         45 . The method according to  claim 42 , wherein the electrodeposition process is tailored to apply the nanocrystalline or amorphous material with varying compositions or grain sizes. 
     
     
         46 . The method according to  claim 42 , wherein the nanocrystalline or amorphous material is an alloy comprising tungsten (W) and at least one other element. 
     
     
         47 . The method according to  claim 46 , wherein the electrodeposition process involves the application of a reverse pulsed current. 
     
     
         48 . The method according to  claim 42 , wherein the electrodeposition process has an electrical potential having periods of both positive polarity and negative polarity. 
     
     
         49 . the method according to  claim 42 , wherein the electrical potential is pulsed more that once. 
     
     
         50 . The method according to  claim 42 , wherein the electrodeposition process involves the application of a reverse pulsed current. 
     
     
         51 . The method according to  claim 42 , further comprising processing said component surface further in order to bring the geometry of said component to within a desired dimensional size. 
     
     
         52 . A product manufactured according to the process of  claim 42 .