Thin-film battery methods for complexity reduction

Abstract

Thin-film battery methods for complexity reduction are described. Processing equipment arrangements suitable to support thin-film battery methods for complexity reduction are also described. Cluster tools to support thin-film battery methods for complexity reduction are also described.

1 - 5 . (canceled) 
     
     
         6 . A method of fabricating a thin-film battery, the method comprising:
 forming, above a substrate, a first protective coating layer on an anode layer of the thin-film battery in an atmosphere inert to the anode layer; and, subsequently,   exposing the first protective coating layer to an atmosphere substantially comprising O 2 , H 2 O N 2 , CO and CO 2 ; and, subsequently,   masking the first protective coating layer; and, subsequently,   forming a second protective coating layer on the first protective coating layer.   
     
     
         7 . The method of  claim 6 , further comprising:
 prior to forming the first protective coating layer, lithiating the anode layer.   
     
     
         8 . The method of  claim 6 , further comprising:
 prior to forming the first protective coating layer, annealing the anode layer.   
     
     
         9 . The method of  claim 6 , further comprising:
 prior to forming the first protective coating layer, lithiating the anode layer; and, subsequently,   annealing the anode layer.   
     
     
         10 - 20 . (canceled) 
     
     
         21 . The method of  claim 6 , wherein the anode layer is formed in a first chamber of a cluster tool, and the first protective coating layer is formed in a second chamber of the cluster tool. 
     
     
         22 . The method of  claim 7 , wherein the anode layer is formed in a first chamber of a cluster tool, the first protective coating layer is formed in a second chamber of the cluster tool, and lithiating the anode layer is performed in a third chamber of the cluster tool. 
     
     
         23 . The method of  claim 8 , wherein the anode layer is formed in a first chamber of a cluster tool, the first protective coating layer is formed in a second chamber of the cluster tool, and annealing the anode layer is performed in a third chamber of the cluster tool.