Method and system for optimizing optical inspection of patterned structures

Abstract

A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.

1 . A system for use in inspection of patterned structures, the system comprising:
 data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and   data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.   
     
     
         2 . The system of  claim 1 , wherein said data processing and analyzing utility comprises an identifier utility configured and operable for processing data indicative of said image data and determining a contour for at least one feature of the pattern, and a geometrical model creator utility connected to said identifier utility and operable for the determination of the geometrical model. 
     
     
         3 . The system of  claim 1 , wherein said data processing and analyzing utility comprises an identifier utility configured and operable for processing the image data and identifying at least one unit cell comprising said at least one feature of the pattern, and generating said data to the contour identifier utility. 
     
     
         4 . The system of  claim 1 , comprising a memory utility. 
     
     
         5 . The system of  claim 4 , wherein the memory utility serves for storing certain design rule data indicative of at least one feature of a pattern in said structure. 
     
     
         6 . The system of  claim 1 , wherein said data processing and analyzing utility is configured and operable for receiving measured data of said second type and processing it for optimizing the first image data. 
     
     
         7 . The system of  claim 1 , wherein the image data is measured data obtained by a scanning tool. 
     
     
         8 . The system of  claim 7 , wherein said scanning tool includes at least one of SEM and AFM tool. 
     
     
         9 . The system of  claim 1 , wherein said second type of data corresponds to measured data obtainable by a scatterometer. 
     
     
         10 . A measurement system comprising at least one measurement tool for obtaining measured data of at least one of the first and second types, and said system of any one of the preceding claims configured for communicating with said at least one measurement tool. 
     
     
         11 . A scatterometry system comprising a measurement tool configured and operable for measuring on patterned structures and generating optical data of a second type, and said system according to  claim 1 . 
     
     
         12 . A method for use in inspection of patterned structures, the method comprising:
 receiving first type of data indicative of image data on at least a part of the patterned structure,   processing and analyzing data indicative of the image data and determining a geometrical model for at least one feature of a pattern in said structure,   using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.   
     
     
         13 . The method of  claim 12 , wherein said determining of the geometrical model comprises processing and analyzing data indicative of the received image data and determining a contour for at least one feature of the pattern, and processing said at least one contour for the determination of the geometrical model. 
     
     
         14 . The method of  claim 12 , comprising processing and analyzing the received image data and identifying at least one unit cell comprising said at least one feature of the pattern. 
     
     
         15 . The method of  claim 12 , comprising providing certain design rule data indicative of at least one feature of a pattern in said structure. 
     
     
         16 . The method of  claim 12 , comprising receiving measured data of said second type and processing it for optimizing the first image data. 
     
     
         17 . The method of  claim 12 , wherein the image data is measured data obtained by a scanning tool. 
     
     
         18 . The method of  claim 17 , wherein said scanning tool includes at least one of SEM and AFM tool. 
     
     
         19 . The method of  claim 12 , wherein said second type of data corresponds to measured data obtainable by a scatterometer. 
     
     
         20 . The method of  claim 12 , wherein said patterned structures are semiconductor wafers. 
     
     
         21 . A method for use in inspection of patterned structures, the method comprising:
 receiving image data indicative of one or more images of at least a part of the patterned structure obtained by a scanning tool,   processing and analyzing data indicative of said image data and determining a geometrical model for at least one feature of a pattern in said structure,   using said geometrical model for determining an optical model for scatterometry based optical measurements on a patterned structure, thereby enabling use of said geometrical model for interpreting scatterometry based measurements applied to the patterned structure progressing on a production line.