US2014141267A1PendingUtilityA1

Near-field noise suppression film

Assignee: KAGAWA SEIJIPriority: Jun 30, 2011Filed: Jun 27, 2012Published: May 22, 2014
Est. expiryJun 30, 2031(~4.9 yrs left)· nominal 20-yr term from priority
Inventors:Seiji Kagawa
Y10T428/31681H01Q 17/00C23C 14/5806C23C 14/20H05K 9/0084
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Claims

Abstract

A noise suppression film having reduced unevenness of electromagnetic wave noise absorbability, which comprises a thin Ni film, which is vapor-deposited on one surface of a stretched plastic film of polyethylene terephthalate, and then subject to a heat-shrinkage-causable heat treatment at a temperature in a range of 110-170° C. for 10 minutes to 1 hour, (a) the light transmittance of the thin Ni film measured with laser rays having a wavelength of 660 nm being 3-50%, and (b) the surface resistance of the thin Ni film being 10-200 Ω/square when measured on its square test piece TP of 10 cm×10 cm under a load of 3.85 kg applied via a flat pressure plate, with a pair of electrodes each having a length completely covering a side of the test piece disposed on opposing side portions of the test piece.

Claims

exact text as granted — not AI-modified
1 . A noise suppression firm having reduced unevenness of electromagnetic wave noise absorbability, which comprises a thin Ni film, which is vapor-deposited on one surface of a stretched plastic film of polyethylene terephthalate, and then subject to a heat-shrinkage-causable heat treatment at a temperature in a range of 110-170° C. for 10 minutes to 1 hour, (a) the light transmittance of said thin Ni film measured with laser rays having a wavelength of 660 nm being 3-50%, and (b) the surface resistance of said thin Ni film being 10-200 Ω/square when measured on its square test piece TP of 10 cm×10 cm under a load of 3.85 kg applied via a flat pressure plate, with a pair of electrodes each having a length completely covering a side of said test piece disposed on opposing side portions of said test piece. 
     
     
         2 . The noise suppression film according to  claim 1 , wherein the heat treatment temperature of said thin Ni film is 130-160° C. 
     
     
         3 . The noise suppression film according to  claim 1 , wherein the heat treatment time of said thin Ni film is 20-40 minutes. 
     
     
         4 . The noise suppression film according to  claim 1 , wherein a protective film is laminated on said thin Ni film.

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