Debris Removal in High Aspect Structures

Abstract

A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.

What is claimed is: 
     
         1 . A system for removing debris from a surface of a photolithographic mask, comprising:
 an atomic force microscope, including:
 a cantilever, and 
 a tip supported by the cantilever, the tip including a surface and a nanometer-scaled coating disposed thereon, the nanometer-scaled coating having a surface energy lower than a surface energy of the photolithographic mask. 
   
     
     
         2 . The system of  claim 1 , further comprising a pallet attached to a stage that supports the photolithographic mask, and a material disposed on the pallet, wherein the material is softer than the tip. 
     
     
         3 . The system of  claim 1 , wherein the nanometer-scaled coating is polytetrafluoroethylene. 
     
     
         4 . The system of  claim 1 , wherein the tip further includes at least one fibril extending therefrom. 
     
     
         5 . The system of  claim 4 , wherein the at least one fibril consists of a plurality of fibrils. 
     
     
         6 . The system of  claim 4 , wherein the at least one fibril is configured to coil around a particle. 
     
     
         7 . The system of  claim 4 , wherein the at least one fibril is attached to a distal end of the tip. 
     
     
         8 . The system of  claim 2 , wherein the tip includes a metallic material disposed between the surface and the nanometer-scaled coating. 
     
     
         9 . The system of  claim 2 , wherein the tip includes an oxide material disposed between the surface and the nanometer-scaled coating. 
     
     
         10 . The system of  claim 2 , wherein the tip includes a metal oxide material disposed between the surface and the nanometer-scaled coating. 
     
     
         11 . A system for removing debris from a surface of a substrate, comprising:
 an atomic force microscope, including:
 a cantilever, and 
 a tip supported by the cantilever, the tip including a surface and a nanometer-scaled coating disposed thereon, the nanometer-scaled coating having a surface energy lower than a surface energy of the substrate. 
   
     
     
         12 . The system of  claim 11 , further comprising a patch attached to a stage that supports the substrate, and a material disposed on the patch, wherein the material is softer than the tip. 
     
     
         13 . The system of  claim 11 , wherein the nanometer-scaled coating is polytetrafluoroethylene. 
     
     
         14 . The system of  claim 11 , wherein the tip further includes at least one fibril extending therefrom. 
     
     
         15 . The system of  claim 14 , wherein the at least one fibril consists of a plurality of fibrils. 
     
     
         16 . The system of  claim 14 , wherein the at least one fibril is configured to coil around a particle. 
     
     
         17 . The system of  claim 14 , wherein the at least one fibril is attached to a distal end of the tip. 
     
     
         18 . The system of  claim 12 , wherein the tip includes a metallic material disposed between the surface and the nanometer-scaled coating. 
     
     
         19 . The system of  claim 12 , wherein the tip includes an oxide material disposed between the surface and the nanometer-scaled coating. 
     
     
         20 . The system of  claim 12 , wherein the tip includes a metal oxide material disposed between the surface and the nanometer-scaled coating.