Method for Imprinting and Erasing Amorphous Metal Alloys

Abstract

The present invention relates to materials, methods and apparatuses for performing imprint lithography using amorphous metallic materials. The amorphous metallic materials can be employed as imprint media and thermoplastic forming processes are applied during the pattern transfer procedure to produce micron scale and nanoscale patterns in the amorphous metallic layer. The pattern transfer is in the form of direct mask embossing or through a serial nano-indentation process. A rewriting process is also disclosed, which involves an erasing mechanism that is accomplished by means of a second thermoplastic forming process. The amorphous metallic materials may also be used directly as an embossing mold in imprint lithography to allow high volume imprint nano-manufacturing. This invention also comprises of a method of smoothening surfaces under the action of the surface tension alone.

1 - 28 . (canceled) 
     
     
         29 . A rewritable high-density data storage media comprising an amorphous metal alloy layer,
 wherein the amorphous metal alloy layer is capable of being imprinted to form a pattern in the amorphous metal alloy layer, wherein the pattern comprises microfeatures or nanofeatures, and   wherein the amorphous metal alloy layer is capable of being smoothed to erase the pattern in the amorphous metal alloy layer.   
     
     
         30 - 31 . (canceled) 
     
     
         32 . The rewritable high-density data storage media according to  claim 29 , wherein the amorphous metal alloy layer is imprinted to form a desired pattern therein by:
 a) heating the amorphous metal alloy layer to a temperature within a supercooled liquid temperature region of the amorphous metal alloy for a period of time to soften the amorphous metal alloy layer;   b) transferring the desired pattern into the softened amorphous metal alloy layer; and   c) cooling the amorphous metal alloy layer to a temperature below the supercooled liquid temperature region of the amorphous metal alloy to resolidify the amorphous metal alloy layer.   
     
     
         33 . The rewritable high-density data storage media according to  claim 29 , wherein a pattern formed in the amorphous metal alloy layer is erased by heating the patterned amorphous metal alloy layer to a temperature within a supercooled liquid temperature region of the amorphous metal alloy for a period of time to soften the amorphous metal alloy,
 whereby the amorphous metal alloy layer is smoothed to erase the pattern.   
     
     
         34 . The rewritable high-density data storage media according to  claim 29 , wherein the patterning and erasing steps are performed multiple times. 
     
     
         35 . The rewritable high-density data storage media according to  claim 33 , wherein the surface tension of the heated amorphous metal alloy layer is approximately 1 N/m. 
     
     
         36 . The rewritable high-density data storage media according to  claim 29 , wherein the amorphous metal alloy is selected from the group consisting of platinum-based, zirconium-based, iron-based, palladium-based, copper-based, nickel-based, cerium-based, gold-based and combinations of one or more of the foregoing. 
     
     
         37 . The rewritable high-density data storage media according to  claim 32 , wherein the step of cooling the amorphous metal alloy layers comprises cooling the amorphous metal alloy layer to approximately room temperature. 
     
     
         38 . The rewritable high-density data storage media according to  claim 37 , wherein the amorphous metal alloy layer is slow cooled to room temperature. 
     
     
         39 . The rewritable high-density data storage media according to  claim 38 , wherein the step of slow cooling comprises cooling at a rate of about 0.5° C./second. 
     
     
         40 . The rewritable high-density data storage media according to  claim 32 , wherein the step of transferring the desired pattern into the amorphous metal alloy layer comprises:
 a) pressing a mold having a desired pattern disposed therein into the softened amorphous metal alloy layer to transfer the desired pattern into the softened amorphous metal alloy layer; and   b) removing the mold from the amorphous metal alloy layer once the amorphous metal alloy layer has cooled to a temperature below the supercooled liquid temperature region of the amorphous metal alloy;   whereby the desired pattern is transferred from the mold to the amorphous metal alloy layer.   
     
     
         41 . The rewritable high-density data storage media according to  claim 32 , wherein the step of transferring the desired pattern into the amorphous metal alloy layer comprises the steps of:
 a) heating a tip of a scanning probe to a processing temperature, wherein the processing temperature is a temperature at which a pressure generated by the tip exceeds a flow stress of the amorphous metal alloy layer being patterned; and   b) pressing the tip of the scanning probe into the softened amorphous metal alloy layer to provide a series of indentations in a desired pattern in the amorphous metal alloy layer.   
     
     
         42 . The rewritable high-density data storage media according to  claim 41 , wherein the tip of the scanning probe is serially pressed into the softened amorphous metal alloy layer for an indentation time of about 10 −3  seconds each time. 
     
     
         43 . The rewritable high-density data storage media according to  claim 29 , wherein the high-density data storage media has a storage capacity of 300 GB.