Dual-imprint pattern for apparatus

Abstract

Provided herein is an apparatus, including an imprint template including a dual-imprint pattern, wherein the dual-imprint pattern is characteristic of imprinting a first pattern on the template with a first template and a second pattern on the template with a second template, and wherein the first pattern and the second pattern at least partially overlap to form the dual-imprint pattern.

1 - 20 . (canceled) 
     
     
         21 . An apparatus, comprising:
 an imprint template comprising a cross-hatched pattern,
 wherein the cross-hatched pattern is characteristic of imprinting
 a first pattern on the template with a first template and 
 a second pattern on the template with a second template, and 
 
 wherein the first pattern and the second pattern at least partially overlap to form the cross-hatched pattern; and 
   a backing plate bonded to the imprint template.   
     
     
         22 . The apparatus of  claim 21 , wherein the first pattern comprises a concentric line pattern. 
     
     
         23 . The apparatus of  claim 21 , wherein the second pattern comprises a radial line pattern. 
     
     
         24 . The apparatus of  claim 23 , wherein the radial line pattern comprises positive oblique radial lines, negative oblique radial lines, or a combination thereof. 
     
     
         25 . The apparatus of  claim 21 , wherein the cross-hatched pattern comprises protruding features arranged in radial zones across the imprint template. 
     
     
         26 . The apparatus of  claim 25 , wherein the protruding features maintain constant angular and radial pitch within each radial zone. 
     
     
         27 . An apparatus, comprising:
 an imprint template comprising a cross-hatched pattern,
 wherein the cross-hatched pattern is characteristic of imprinting
 a first pattern on the template with a first template and 
 a second pattern on the template with a second template, and 
 
 wherein the first pattern and the second pattern at least partially overlap to form the cross-hatched pattern. 
   
     
     
         28 . The apparatus of  claim 27 , wherein the first pattern comprises a concentric line pattern, and wherein the second pattern comprises a radial line pattern. 
     
     
         29 . The apparatus of  claim 28 , wherein the second pattern comprises a radial line pattern of positive oblique radial lines, negative oblique radial lines, or a combination thereof. 
     
     
         30 . The apparatus of  claim 28 , wherein the cross-hatched pattern comprises protruding features arranged in radial zones across the imprint template. 
     
     
         31 . The apparatus of  claim 30 , wherein the protruding features maintain constant angular and radial pitch within each radial zone. 
     
     
         32 . The apparatus of  claim 30 , wherein the density of protruding features is about the same in each radial zone. 
     
     
         33 . An apparatus, comprising:
 an imprint template comprising a dual-imprint pattern,
 wherein the dual-imprint pattern is characteristic of imprinting
 a first pattern on the template with a first template and 
 a second pattern on the template with a second template, and 
 
 wherein the first pattern and the second pattern at least partially overlap to form the dual-imprint pattern. 
   
     
     
         34 . The apparatus of  claim 33 , wherein the dual-imprint pattern comprises a cross-hatched pattern. 
     
     
         35 . The apparatus of  claim 33 , wherein the first pattern comprises a concentric line pattern. 
     
     
         36 . The apparatus of  claim 33 , wherein the second pattern comprises a radial line pattern. 
     
     
         37 . The apparatus of  claim 33 , wherein the dual-imprint pattern comprises protruding features arranged in radial zones across the imprint template. 
     
     
         38 . The apparatus of  claim 37 , wherein the protruding features maintain constant angular and radial pitch within each radial zone, and wherein the density of protruding features is about the same in each radial zone. 
     
     
         39 . The apparatus of  claim 33 , wherein the dual-imprint pattern comprises protruding features skewed at inner and outer dimensions of the imprint template to accommodate head skew effects in corresponding patterned recording media of data storage devices. 
     
     
         40 . The apparatus of  claim 33 , further comprising a backing plate, wherein the imprint template is characteristic of a mandrel slice, and wherein the mandrel slice is bonded to the backing plate.