Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate
Abstract
A method of forming a patterned photoresist layer having a hydrophobic surface is provided. The method includes forming a photoresist layer on a substrate and image patterning. The photoresist layer may comprise a polymeric material. The imaged photoresist layer may then undergo a two-stage post-exposure bake. A surface treatment may be performed on the photoresist layer in between the two-stage post-exposure bake. The surface treatment may include applying a siloxane solution on a partially post-exposure baked photoresist layer. The post-exposure baked photoresist layer may then be developed to form the patterned photoresist layer. The method may be used to form a hydrophobic photoimageable nozzle plate of a micro-fluid ejection head having improved mechanical properties and stable hydrophobic properties.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A micro-fluid ejection head comprising:
a substrate; a flow feature layer formed on top of the substrate; and a photoimageable nozzle plate attached on top of the flow feature layer, the photoimageable nozzle plate having a top surface treated with epoxy functionalized siloxane resin, the treated top surface having a hydrophobic characteristic.
2 . The micro-fluid ejection head of claim 1 , wherein the photoimageable nozzle plate comprises a polymeric material with photoacid generator.
3 . The micro-fluid ejection head of claim 1 , wherein the epoxy functionalized siloxane resin comprises a terminal glycidyl ether group.
4 . The micro-fluid ejection head of claim 1 , wherein the epoxy functionalized siloxane resin comprises a pendant glycidyl ether group.
5 . The micro-fluid ejection head of claim 1 , wherein the epoxy functionalized siloxane resin comprises a pendant cyclohexene oxide group.
6 . The micro-fluid ejection head of claim 1 , wherein the epoxy functionalized siloxane resin comprises a terminal cyclohexene oxide group.Cited by (0)
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