Anodic structure for horizontal cells for processes of metal electrodeposition
Abstract
The present invention concerns an electrode for oxygen evolution in electroplating plants comprising a valve metal substrate and an outer catalytic layer, the substrate consisting of a metal plate provided with slits of area ranging from 2 to 8 cm 2 , said slits being spaced apart by a distance of 5 to 25 cm. The invention also concerns a horizontal electrochemical cell for electro-plating processes comprising at least one of said electrodes, and an electroplating plant equipped with at least one of said cells. The invention also concerns an electroplating process comprising the step of anodically evolving oxygen on the surface of said electrode.
Claims
exact text as granted — not AI-modified1 . Electrode for oxygen evolution in electroplating plants comprising a valve metal substrate and an outer catalytic layer, the substrate consisting of a metal plate provided with slits of area ranging from 2 to 8 cm 2 , said slits being spaced apart by a distance of 5 to 25 cm.
2 . The electrode according to claim 1 wherein said slits are regularly spaced apart.
3 . The electrode according to claim 1 wherein said slits have an elongated shape.
4 . The electrode according to claim 1 wherein said slits have an area of 3 to 5 cm 2 .
5 . The electrode according to claim 1 wherein said valve metal is titanium and said catalytic layer comprises oxides of iridium, tantalum and titanium.
6 . A horizontal electrochemical cell for electroplating processes comprising at least one electrode according to claim 1 .
7 . Cell according to claim 6 , wherein said at least one electrode comprises elongated slits arranged with the major side perpendicular to the direction of advancement of the metal ribbon or wire used as the cathode.
8 . Cell according to claim 6 , comprising:
a. an upper row of anodes and a lower row of anodes, arranged one above the other; and b. a cathode consisting of a continuous metal ribbon or wire subject to an advancing motion between said upper row of anodes and said lower row of anodes, the direction of advancement being parallel to said parallel rows of anodes, wherein said at least one electrode is one anode of said upper row of anodes.
9 . Electroplating plant equipped with at least one cell according to claim 6 .
10 . Electroplating process comprising the step of anodically evolving oxygen on the surface of an electrode according to claim 1 .Join the waitlist — get patent alerts
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