Methods for creating large-area complex nanopatterns for nanoimprint molds

Abstract

Some embodiments of the invention provide methods that can create large area complex patterns for nanoimprint molds without or with very litter of the use of the charged beam or photon beam direct-writing of nanostructures. Some embodiments of the invention use (i) Fourier nanoimprint patterning (FNP), (ii) edge-guided nanopatterning (EGN), and (iii) nanostructure self-perfection, and their combinations.

What is claimed is: 
     
         1 . A method for creating a complex periodic nanopattern, comprising:
 (a) obtaining a nanoimprint mold having a pattern that is one of the Fourier components of the complex nanopattern;   (b) imprint a daughter mold substrate by transferring the pattern to create the Fourier component on the daughter mold;   (c) obtaining another nanoimprint mold having a pattern that is a second Fourier component of the complex nanopattern; and   (d) repeating steps (b) and (c), until the final pattern on the daughter mold is substantially similar to the complex nanopattern;   thereby creating the complex periodic nanopattern.