US2014291157A1PendingUtilityA1

Transfer mold manufacturing method, transfer mold manufactured thereby, and component produced by the transfer mold

Assignee: SANO TAKASHIPriority: Nov 15, 2011Filed: Nov 15, 2011Published: Oct 2, 2014
Est. expiryNov 15, 2031(~5.3 yrs left)· nominal 20-yr term from priority
C25D 1/10C25D 1/00C25D 1/003C25D 1/22C25D 1/20
48
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

A transfer mold, which has superior durability and high aspect ratio, for production of a component by electroplating and a component produced thereby are provided. A method therefor includes the steps of forming a resist pattern having a shape of a component with a desired aspect ratio on a metal substrate, a sidewall of the resist pattern forming a desired angle, creating a transfer mold by filing up the resist pattern having the shape of the component by electroplating to a predetermined thickness and providing a master mold by separating the transfer mold from the metal substrate.

Claims

exact text as granted — not AI-modified
1 . A transfer mold manufacturing method comprising steps of:
 forming a resist pattern having a shape of a component with a desired aspect ratio on a metal substrate, a sidewall of the resist pattern on a metal substrate side forming a desired angle α less than 90°;   filling up the resist pattern having the shape of the component by electroplating to a predetermined thickness and then   separating mold thus formed from the metal substrate leaving the metal substrate and the resist pattern.   
     
     
         2 . A transfer mold manufacturing method comprising steps of:
 forming a resist pattern having a shape of a component with a desired aspect ratio on a metal substrate, a sidewall of the resist pattern on a metal substrate side forming a desired angle α (α<90°);   filling up the resist pattern having the shape of the component by electroplating to a predetermined thickness; and then   providing a master mold by separating a mold thus formed from the metal substrate leaving the metal substrate and the resist pattern;   creating a son mold by transferring by way of the master mold and a mother mold; and   providing a transfer mold by performing, on the son mold, a releasing layer formation process for facilitating a release of the component to be formed by electroplating and an insulation layer formation process for forming an insulation layer in that portion which is other than a portion in which the component is to be formed.   
     
     
         3 . The method according to  claim 1 , comprising a step of forming a roughening layer on a surface of the metal substrate as a first step. 
     
     
         4 . A transfer mold manufacturing method comprising steps of:
 forming a resist pattern having a shape of a component with a desired aspect ratio on a metal substrate, a sidewall of the resist pattern on a metal substrate side forming an angle of approximately 90°;   filling up the resist pattern having the shape of the component by electroplating to a predetermined thickness and then   separating a mold thus formed from the metal substrate leaving the metal substrate and the resist pattern;   removing a photoresist partially to leave a resist pattern layer in that portion on the separated mold which is other than a portion corresponding to the component to be transferred; and   treating the sidewall of the shape of the component with beam irradiation using the resist pattern layer as a protective layer, the beam irradiation being modulated such that the angle at the sidewall is tailored to form approximately 90° or a desired angle α less than 90°.   
     
     
         5 . A transfer mold manufacturing method comprising steps of:
 forming a resist pattern having a shape of a component with a desired aspect ratio on a metal substrate, a sidewall of the resist pattern on a metal substrate side forming an angle of approximately 90°;   filling up the resist pattern having the shape of the component by electroplating to a predetermined thickness and then   separating a mold thus formed from the metal substrate leaving the metal substrate and the resist pattern;   removing a photoresist partially to leave a resist pattern layer in that portion on the separated mold which is other than a portion corresponding to the component to be transferred;   providing a master mold by treating the sidewall of the shape of the component with beam irradiation using the resist pattern layer as a protective layer, the beam irradiation being modulated such that the angle at the sidewall is tailored to form approximately 90° or a desired angle α less than 90°;   creating a son mold by transferring by way of the master mold and a mother mold; and   providing a transfer mold by performing, on the son mold, a releasing layer formation process for facilitating a release of the component to be formed by electroplating and an insulation layer formation process for forming an insulation layer in that portion which is other than a portion in which the component is to be formed.   
     
     
         6 . The method according to  claim 4 , comprising a step of forming a roughening layer on a surface of the metal substrate as a first step. 
     
     
         7 . A transfer mold manufactured by the method according to  claim 1  having a cross-sectional surface with a desired aspect ratio, a sidewall of the cross-sectional surface forming an angle between 45° and 88°. 
     
     
         8 . A transfer mold manufactured by the method according to  claim 2 . 
     
     
         9 . A component produced by electroplating, the component being molded by the electroplating using the transfer mold according to  claim 8  and transferred.

Join the waitlist — get patent alerts

Track US2014291157A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.