Magnetic patterning method and system

Abstract

The present invention relates to a method and apparatus for patterning a substrate. The method comprises providing at least one magnetic pattern generator configured and operable to modulate the magnetic field to induce varying magnetic properties to a magnetic field according to a desired pattern; applying the modulated magnetic field in the vicinity of the substrate creating a certain pattern of regions of interaction to be obtained on top of the substrate; and; interacting the substrate with magnetic particles, while under the application of the modulated magnetic field, the magnetic particles being attracted to selected regions of interaction defined by the certain pattern while being substantially not attracted to regions outside the regions of interaction, thus creating on top of the substrate the certain pattern of regions interacted with the magnetic particles. The desired pattern corresponds to a certain pattern for a predetermined magnetic field profile and at a predetermined distance from the magnetic pattern generator, where the sample is to be located.

1 - 53 . (canceled) 
     
     
         54 . A patterned structure comprising a substrate having a pattern of
 spaced-apart regions being obtained by interaction with a magnetic field having a desired pattern of magnetic properties and subsequently with magnetic particles, wherein features of the patterned substrate are smaller than features of the pattern of the magnetic field properties.   
     
     
         55 . The patterned structure of  claim 54 , wherein said pattern of spaced-apart regions has a characteristic dimension on a scale of less than hundred of nanometers. 
     
     
         56 . The patterned structure of  claim 54 , wherein a gradient of a magnetic field is applied to the vicinity of said substrate, such that the pattern of regions are interacted with a concentration-gradient of the magnetic particles corresponding to a strength of the gradient of the magnetic field. 
     
     
         57 . The patterned structure of  claim 55 , wherein said pattern of regions has a characteristic dimension narrower than the corresponding characteristic dimension of said gradient of the magnetic field, such that features of the patterned substrate are smaller than features of the pattern of the magnetic field properties created by a patterned mask. 
     
     
         58 . The patterned structure of  claim 54 , being manufactured by the steps of: providing a magnetic field source outside said substrate configured to create a first constant magnetic field in a magnetic field region; providing a patterned mask placed at a predetermined distance and spaced from a surface of said substrate in said magnetic field region, said patterned mask being separate from the substrate and configured to create regions of different magnetic properties of the magnetic field on said surface according to a desired pattern, thereby forming a modulated magnetic field along said surface; operating the magnetic field source thereby applying said modulated magnetic field to said surface of the substrate thus creating a certain pattern of regions of interaction to be obtained on said surface of the substrate; said desired pattern corresponds to said certain pattern for a predetermined magnetic field profile and at said predetermined distance; interacting said substrate with magnetic particles, while under the application of said modulated magnetic field, the magnetic particles being attracted to selected regions of interaction defined by said certain pattern while being substantially not attracted to regions outside said regions of interaction, and creating on said surface of said substrate said certain pattern of regions interacted with the magnetic particles. 
     
     
         59 . The patterned structure of  claim 54 , wherein said substrate has a non-planar surface. 
     
     
         60 . The patterned structure of  claim 54 , wherein said substrate is a tube, the particles being attracted at selected regions of interaction on an inner surface of the tube defined by said desired pattern thus creating in the inner surface of said substrate a pattern of regions interacted with the particles. 
     
     
         61 . The patterned structure of  claim 54 , wherein said substrate is functionalized with a self-assembly monolayer.