Polarized light detecting device and fabrication methods of the same
Abstract
Described herein is a device operable to detect polarized light comprising: a substrate; a first subpixel; a second subpixel adjacent to the first subpixel; a first plurality of features in the first subpixel and a second plurality of features in the second subpixel, wherein the first plurality of features extend essentially perpendicularly from the substrate and extend essentially in parallel in a first direction parallel to the substrate and the second plurality of features extend essentially perpendicularly from the substrate and extend essentially in parallel in a second direction parallel to the substrate; wherein the first direction and the second direction are different; the first plurality of features and the second plurality of features react differently to the polarized light.
Claims
exact text as granted — not AI-modifiedWhat is claimed:
1 . A device operable to detect polarized light comprising: a substrate; a first subpixel; a second subpixel; a first plurality of features in the first subpixel and a second plurality of features in the second subpixel, wherein the first plurality of features extend essentially in parallel in a first direction parallel to the substrate and the second plurality of features extend essentially in parallel in a second direction parallel to the substrate; wherein the first direction and the second direction are different; the first plurality of features and the second plurality of features react differently to the polarized light; wherein the first plurality of features comprises an electronic component, and wherein the electronic component is functional to convert at least a portion of the polarized light to an electrical signal.
2 . The device of claim 1 , wherein the polarized light has linear polarization, circular or elliptical polarization.
3 . The device of claim 1 , wherein the first plurality of features is equally spaced from each other.
4 . The device of claim 1 , wherein space between features of the first plurality of features is filled with a transparent material.
5 . The device of claim 1 , wherein the second subpixel is adjacent to the first subpixel.
6 . The device of claim 1 , wherein the p-i-n diode is functional to convert at least a portion of the polarized light to an electrical signal.
7 . The device of claim 6 , wherein the substrate comprises electrical components configured to detect the electrical signal.
8 . The device of claim 1 , further comprising a first transparent electrode disposed on the first subpixel and electrically connected to each of the first plurality of features, and a second transparent electrode disposed on the second subpixel and electrically connected to each of the second plurality of features, wherein the first and second transparent electrodes are separate.
9 . The device of claim 1 , further comprising a reflective material deposited on areas of the substrate between features of the first plurality of features.
10 . The device of claim 1 , wherein each of the first plurality of features comprises an intrinsic semiconductor layer or a first lightly doped semiconductor layer, and a heavily doped semiconductor layer; the substrate comprises a second lightly doped semiconductor layer; wherein the second lightly doped semiconductor layer is an opposite type from the heavily doped semiconductor layer; intrinsic semiconductor layer or a first lightly doped semiconductor layer is disposed on the second lightly doped semiconductor layer; and the heavily doped semiconductor layer is disposed on the intrinsic semiconductor layer or the first lightly doped semiconductor layer; wherein the heavily doped semiconductor layer, the intrinsic layer or the first lightly doped semiconductor layer, and the heavily doped semiconductor layer form a p-i-n diode.
11 . A polarization detector array, comprising the device of claim 1 and electronic circuitry functional to detect an electrical signal.
12 . The polarization detector array of claim 11 , wherein the electronic circuitry is further functional to calculate an interpolation of subpixels of the device, adjust a gain and/or calculate Stoke's parameters.
13 . The device of claim 1 , wherein the first plurality of features or the second plurality of features have a shape in a cross-section parallel to the substrate selected from the group consisting of a rectangle, an ellipse, convex-convex, concave-concave, plano-convex, and plano-concave.
14 . The device of claim 1 , further comprising a metal layer on each sidewall of each of the first plurality of features and the second plurality of features wherein the metal layer substantially covers the entire sidewall and the metal layer does not extend to either end of the features in a direction perpendicular to the substrate.
15 . A device operable to detect polarized light comprising: a substrate; a first subpixel; a second subpixel; a first plurality of features in the first subpixel and a second plurality of features in the second subpixel; wherein the first plurality of features and the second plurality of features react differently to the polarized light such that polarization of polarized light is determined; wherein each of the first plurality of features comprises a p-i-n diode or forms a p-i-n diode with the substrate.
16 . The device of claim 15 , wherein the first plurality of features are arranged in a different orientation than the second plurality of features.
17 . The device of claim 15 , wherein the features react to polarized light by converting at least a portion thereof to electrical signal.
18 . The device of claim 15 , wherein the first plurality of features and the second plurality of features are substantially shaped as blocks or prisms having a substantially rectangular shaped base, wherein the blocks or prisms protrude from a surface of the substantially rectangular shaped base.
19 . A method of fabricating a device of claim 1 ; the method comprising: forming at least one of the first plurality of features and the second plurality of features by conducting lithography, ion implantation, annealing, evaporation, atomic layer deposition, chemical vapor deposition, dry etch or a combination thereof.
20 . A method of fabricating a device of claim 15 ; the method comprising: conducting lithography, ion implantation, annealing, evaporation, atomic layer deposition, chemical vapor deposition, dry etch or a combination thereof.Cited by (0)
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