Multi-junction solar cell devices
Abstract
A photovoltaic cell structure for manufacturing a photovoltaic device. The photovoltaic cell structure includes a substrate including a surface region. A first conductor layer overlies the surface region. The photovoltaic cell structure includes a lower cell structure. The lower cell structure includes a first P type absorber layer using a first semiconductor metal chalcogenide material and/or other semiconductor material overlying the first conductor layer. The first P type absorber material is characterized by a first bandgap ranging from about 0.5 eV to about 1.0 eV, a first optical absorption coefficient greater than about 10 4 cm −1 . The lower cell structure includes a first N + type window layer comprising at least a second metal chalcogenide material and/or other semiconductor material overlying the first P absorber layer. The photovoltaic cell structure includes an upper cell structure. The upper cell structure includes a second P type absorber layer using a third semiconductor metal chalcogenide material. The second P type absorber layer is characterized by a second bandgap ranging from about 1.0 eV to 2.2 eV and a second optical absorption coefficient greater than about 10 4 cm −1 . A second N + type window layer comprising a fourth metal chalcogenide material overlies the second P absorber layer. A tunneling junction layer is provided between the upper cell structure and the lower cell structure.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A photovoltaic cell structure for manufacturing a photovoltaic device, the photovoltaic cell structure comprises:
a substrate including a surface region; a first conductor layer overlying the surface region; a lower cell structure, the lower cell structure comprising
a first P type absorber comprising at least a first metal chalcogenide material and/or other suitable semiconductor material overlying the first conductor layer;
a first N + type window layer comprising at least a second metal chalcogenide material and/or other suitable semiconductor material overlying the first P type absorber layer;
an upper cell structure, the upper cell structure comprising:
a second P type absorber material comprising at least a third metal chalcogenide material overlying the tunneling junction layer;
a second N + type window layer comprising at least a fourth metal chalcogenide material overlying the second absorber layer, wherein the fourth metal chalcogenide comprises zinc sulfide;
a buffer layer overlying the second N + type window layer of the upper cell structure; the buffer layer being characterized by a resistivity greater than about 10 kohm-cm; and
a second conductor layer overlying the buffer layer; and
an adhesion layer disposed between the first N + type window layer and the second P type absorber material.
2 . The photovoltaic cell structure of claim 1 wherein the substrate is a semiconductor or a compound semiconductor material.
3 . The photovoltaic cell structure of claim 1 wherein the first metal chalcogenide material is selected from a semiconductor metal oxide, a semiconductor metal sulfide, a semiconductor metal selenide, or semiconductor metal telluride.
4 . The photovoltaic cell structure of claim 1 wherein the second metal chalcogenide material is selected from a semiconductor metal oxide, a semiconductor metal sulfide, a semiconductor metal selenide, or a semiconductor metal telluride, or a semiconductor metal silicide.
5 . The photovoltaic cell structure of claim 1 wherein the first P type absorber material being characterized by a first bandgap ranging from 0.5 eV to 1.0 eV, a first optical absorption coefficient greater than about 104 cm-1, and a first thickness ranging from 0.5 μm to 2 μm.
6 . The photovoltaic cell structure of claim 1 wherein the fourth metal chalcogenide material is selected from a semiconductor metal oxide, a semiconductor metal sulfide, a semiconductor metal selenide, or a semiconductor metal telluride.
7 . The photovoltaic cell structure of claim 1 wherein the first P type absorber layer comprises an iron disilicide material.
8 . The photovoltaic cell structure of claim 1 wherein the first N + type window layer comprises a zinc sulfide material.
9 . The photovoltaic cell structure of claim 1 wherein the second P type absorber layer comprises a copper oxide material.
10 . The photovoltaic cell structure of claim 1 wherein the second N + window layer comprises a zinc sulfide material.
11 . The photovoltaic cell structure of claim 1 wherein the first bandgap is less than the second bandgap.
12 . The photovoltaic cell structure of claim 1 wherein the first conductor layer comprises a transparent conducting oxide material selected from ZnO:Al, SnO:F, or ITO.
13 . The photovoltaic cell structure of claim 1 wherein the second conductor layer comprises a transparent conducting oxide material selected from ZnO:Al, SnO:F, or ITO.
14 . The photovoltaic cell structure of claim 1 wherein the adhesion layer comprises ethyl vinyl acetate or polyvinyl butyral.Cited by (0)
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