Movable mask for a thermal and/or kinetic coating system

Abstract

The invention relates to a mask for a coating system having a covering device for an area not to be coated of a substrate to be coated, having a working side exposed to the material flow of the coating material, wherein the covering device for the area not to be coated is comprised of at least one disk that can be rotated, the disk upper side of which is positioned vertically to the material flow of the coating material. A further aspect of the invention includes a thermal and/or kinetic coating system having at least one spray device, and a corresponding method for producing a coated substrate.

1 . A mask for a coating system with a covering device of an area which is not to be coated of a substrate which is to be coated, with a working side which is exposed to the flow of the coating material,
 wherein   the covering device of the area which is not to be coated consists of at least one rotatable disk, the upper side of which is perpendicular to the flow of the coating material.   
     
     
         2 . The mask as claimed in  claim 1 , characterized by a thermal and/or kinetic coating system, especially a cold-gas dynamic spraying system. 
     
     
         3 . The mask as claimed in  claim 1 , wherein a cleaning device is arranged on each rotatable disk on the side facing away from the substrate. 
     
     
         4 . The mask as claimed in  claim 1 , wherein an arrangement is made for two contra-rotating disks which are spaced apart so that a coating gap remains. 
     
     
         5 . The mask as claimed in  claim 4 , wherein the rotatable disks have a variably adjustable coating gap within the width of a coating which is to be produced. 
     
     
         6 . The mask as claimed in  claim 1 , wherein the at least one rotatable disk has a corrugated or serrated outer contour and/or openings for selective deposition. 
     
     
         7 . The mask as claimed in  claim 1 , wherein the surface of a rotatable disk has a poor adhesion for the sprayed material. 
     
     
         8 . The mask as claimed in  claim 7 , wherein at least the surface of the rotatable disks consists of steel, hard metal, ceramic, glass, DLC, hard chrome or graphite. 
     
     
         9 . A thermal and/or kinetic coating system with at least one spraying device, wherein
 provision is made for a transporting device which linearly and continuously guides through a substrate which is to be coated beneath the at least one spraying device, and   arrangement is made for a mask with a covering device of an area which is not to be coated of a substrate which is to be coated, as claimed in  claim 1 , or as a continuously revolving tape mask.   
     
     
         10 . The thermal and/or kinetic coating system as claimed in  claim 9 , wherein the at least one spraying device is stationary. 
     
     
         11 . The thermal and/or kinetic coating system as claimed in  claim 9 , wherein the at least one spraying device can be oscillated perpendicularly and/or parallel to the substrate throughput direction (L). 
     
     
         12 . The thermal and/or kinetic coating system as claimed in  claim 9 , wherein a mechanical pretreatment device is arranged to precede the spraying device, as seen in the strip movement direction (L). 
     
     
         13 . The thermal and/or kinetic coating system as claimed in  claim 9 , wherein at least one annealing device is arranged to follow the spraying device, as seen in the substrate throughput direction (L). 
     
     
         14 . The thermal and/or kinetic coating system as claimed in  claim 9 , wherein at least one cold rolling device is arranged to follow the spraying device, as seen in the substrate throughput direction (L). 
     
     
         15 . The thermal and/or kinetic coating system as claimed  claim 9 , wherein a milling device is arranged to follow the spraying device, as seen in the strip movement direction. 
     
     
         16 . A method for producing a coated substrate by means of a thermal and/or kinetic coating system, characterized by the following steps:
 optionally pretreating the working side of the substrate;   linear and continuous passing through of the substrate beneath a spraying device, wherein the working side of the substrate, by means of a mask consisting of at least one rotating disk, the upper side of which is perpendicular to the flow of the coating material, or by means of a continuously revolving tape mask in the region of a spray jet, is partially covered and only partially subjected to deposition;   optionally in each case, at least one annealing, at least one cold rolling and a milling of the coating which is applied to the substrate.