US2015270243A1PendingUtilityA1

Semiconductor Device Package and Method of the Same

Assignee: KING DRAGON INTERNAT INCPriority: Mar 24, 2014Filed: May 8, 2015Published: Sep 24, 2015
Est. expiryMar 24, 2034(~7.7 yrs left)· nominal 20-yr term from priority
H10P 34/42H10W 99/00H10W 90/734H10W 90/731H10W 90/724H10W 90/722H10W 90/721H10W 90/401H10W 80/743H10W 74/15H10W 74/00H10W 72/9413H10W 72/07338H10W 72/07337H10W 72/07254H10W 72/07236H10W 72/07232H10W 72/07223H10W 72/01908H10W 72/952H10W 72/944H10W 72/354H10W 72/252H10W 72/242H10W 72/29H10W 70/681H10W 70/65H10W 70/60H10W 70/05H10W 46/607H10W 46/301H10W 90/00H10W 72/00H10W 70/635H10W 70/611H10W 46/00H10W 20/081H10P 52/00H01L 24/81H01L 24/91H01L 2224/02372H01L 2224/8385H01L 2224/81815H01L 21/304H01L 2224/0231H01L 2224/8113H01L 24/83H01L 21/76802H01L 21/268H01L 2224/81201
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Claims

Abstract

The invention proposes a semiconductor device package structure, comprising a substrate, an adhesive layer and a die. The substrate has electrical through-holes to inter-connect a first and second wiring circuit on a top surface and a bottom surface of the substrate respectively, wherein a contact conductive bump is formed on the first wiring circuit. The under-fill adhesive layer is formed on the top surface and the first wiring circuit of the substrate except the area of the die. The die has a bump structure on the bonding pads of the die, wherein the bump structure of the die is electrically connected to the contact conductive bump of the first wiring circuit of the substrate.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method for forming a semiconductor device package, comprising:
 preparing a first substrate and a second substrate, wherein said first substrate includes a wiring circuit and an aligning mark disposed on a top surface thereof and a contact conductive bump is formed on said wiring circuit;   opening a die opening window through said second substrate by using a laser or punching method;   preparing an adhesive material;   attaching said second substrate to said first substrate by said adhesive material such that said adhesive material is disposed between said top surface of said first substrate and a bottom surface of said second substrate to directly attach said second substrate onto said first substrate;   aligning a die with a bump structure on the bonding pads of said die by using said aligning mark and attaching said die onto said contact conductive bump with force by said adhesive material such that said bump structure of said die is electrically connected to said contact conductive bump of said wiring circuit of said first substrate;   forming a dielectric layer on a top surface of said second substrate and said die and pushing said dielectric layer into a gap between a side wall of said die and a side wall of said die opening window;   opening a plurality of via openings in said dielectric layer; and   forming a redistribution layer in said plurality of via openings and on said dielectric layer.   
     
     
         2 . The method of  claim 1 , further comprising a step of forming a cover layer on a top surface of said dielectric layer and a top surface of said redistribution layer. 
     
     
         3 . A method for forming a semiconductor device package, comprising:
 preparing carrier tools with alignment mark   setting a first substrate with first wiring circuits on both site and an adhesive layer on a top surface of said first substrate, and aligning said first substrate on said carrier tool with said alignment mark matching;   setting a second substrate with second wiring circuits on both site and a die open area, and aligning and placing said second substrate on said adhesive layer of said first substrate;   aligning and placing a die with metallization bump structure into said die open area and attached on said adhesive layer of said first substrate;   bonding said first substrate with adhesive layer, said substrate and said die by a panel bonder together with said carrier tools to adhere said first substrate, said second substrate and said die together and re-flowing said metallization bump for electrical inter-connecting between said first substrate, said second substrate and said die.

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