Solvent resistant polymeric membranes

Abstract

A radiation curable composition for preparing a polymeric membrane includes a) a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone (PES), a polyether etherketone (PEEK), a polyvinylchloride (PVC), a polyacrylonitrile (PAN), a polyvinylidene fluoride (PVDF), a polyimide (PI), a polyamide (PA) and copolymers thereof; b) a hydrophobic monomer or oligomer having at least two free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group; and c) an organic solvent for the membrane polymer and the hydrophobic monomer. A polymeric membrane and a method for manufacturing the membrane are also disclosed.

1 - 15 . (canceled) 
     
     
         16 . A radiation curable composition for manufacturing a polymeric membrane, the radiation curable composition comprising:
 a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone, a polyether etherketone, a polyvinylchloride, a polyacrylonitrile, a polyvinylidene fluoride, a polyimide, a polyamide, and copolymers thereof;   a hydrophobic monomer or oligomer including at least two free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group;   an organic solvent for the membrane polymer and the hydrophobic monomer or oligomer; and   an acyl phosphineoxide photoinitiator having a maximum absorption at a wavelength above 320 nm.   
     
     
         17 . The radiation curable composition according to  claim 16 , wherein the hydrophobic monomer or oligomer includes at least three free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group. 
     
     
         18 . The radiation curable composition according to  claim 16 , wherein the hydrophobic monomer or oligomer includes at least four free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group. 
     
     
         19 . The radiation curable composition according to  claim 16 , wherein the membrane polymer is selected from the group consisting of a polysulfone, a polyether sulfone, a polyimide, and a polyether etherketone. 
     
     
         20 . The radiation curable composition according to  claim 16 , wherein the hydrophobic monomer or oligomer is selected from the group consisting of an acrylate group and a methacrylate group. 
     
     
         21 . The radiation curable composition according to  claim 16 , wherein the membrane polymer is a polysulfone having repeating units according to Formula (I)
   —Ar1-SO 2 —Ar2-X—(R1-Y) n —  Formula (I)
   
       wherein:
 Ar1 and Ar2 represent an aryl group; 
 Ar1 and Ar2 may represent the same aryl group or a different aryl group; 
 X and Y are independently selected from the group consisting of an oxygen, a sulfur, an amine group, and a substituted or unsubstituted methylene group; 
 n is an integer representing 0 or 1; 
 R1 is selected from the group consisting of an aryl group and a group according to Formula (II):
   —Ar3-Z—Ar4-   Formula (II)
 
 
 
       wherein:
 Ar3 and Ar4 represent an aryl group; 
 Ar3 and Ar4 may represent the same aryl group or a different aryl group; 
 Z represents a group selected from the group consisting of O, S(O) m , and a substituted or unsubstituted methylene group; and 
 m is an integer representing 0 or 1. 
 
     
     
         22 . The radiation curable composition according to  claim 16 , wherein a weight ratio between the membrane polymer and the hydrophobic monomer or oligomer is between 10 to 1 and 1 to 1. 
     
     
         23 . The radiation curable composition according to  claim 16 , wherein a weight ratio between the membrane polymer and the photoinitiator is between 12 to 1 and 1 to 1. 
     
     
         24 . A method for manufacturing a polymeric membrane, the method comprising, in order, the steps of:
 a) preparing a radiation curable composition according to  claim 16 ;   b) coating a layer of the radiation curable composition onto a porous support;   c) phase inverting the coated layer; and   d) curing the phase inverted coated layer by actinic radiation.   
     
     
         25 . The method according to  claim 24 , wherein the step b) is performed by roll to roll coating. 
     
     
         26 . The method according to  claim 24 , further comprising the step of:
 e) conditioning the polymeric membrane by immersing the polymeric membrane in a solution including a conditioning agent and a solvent.