Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate
Abstract
Provided is a resin for nanoimprinting, which is capable of preventing removal of a transfer-receiving resin from a substrate when a mold is separated during nanoimprinting, and which is also capable of transferring a pattern on a mold to a transfer-receiving resin with high accuracy during thermal nanoimprinting, while improving the throughput. A resin for nanoimprinting, which is represented by formula (1). (In the formula, each of R 1 -R 5 independently represents —H or —OH, and at least one of the R 1 -R 5 moieties represents —OH; R 6 represents a linear, branched or cyclic alkyl group having 1-20 carbon atoms, an aryl group having 6-20 carbon atoms or an aralkyl group having 7-20 carbon atoms; X represents an amide or an ester; Y may be absent, or represents an amide or an ester; P represents an integer of 1-10; and each of m and n represents an integer of 1 or more.)
Claims
exact text as granted — not AI-modified1 . A nanoimprinting resin represented by formula (1) below.
(In the formula, each of R 1 -R 5 independently represents —H or —OH, at least one of R 1 -R 5 representing —OH. R 6 represents a C 1-20 linear, branched, or cyclic alkyl group, a C 6-20 aryl group, or a C 7-20 aralkyl group. X represents an amide or an ester. Y represents an amide or an ester, or may be absent. P represents an integer from 1 to 10. m and n are integers equal to or greater than 1.)
2 . The nanoimprinting resin of claim 1 , wherein m and n have a ratio such that m:n=1:99-90:10.
3 . The nanoimprinting resin of claim 1 , wherein two of the R 1 -R 5 represent —OH.
4 . The nanoimprinting resin of claim 1 , wherein the nanoimprinting resin is used between a substrate and a transfer-receiving resin to which a mold is to be transferred.
5 . A laminate comprising the nanoimprinting resin of claim 1 .
6 . A substrate comprising the nanoimprinting resin of claim 1 .
7 . A method for manufacturing a nanoimprinting substrate, comprising:
a step for laminating the nanoimprinting resin represented by formula (1) below onto a substrate:
(in the formula, each of R 1 -R 5 independently represents —H or —OH, at least one of R 1 -R 5 representing —OH, R 6 represents a C 1-20 linear, branched, or cyclic alkyl group, a C 6-20 aryl group, or a C 7-20 aralkyl group, X represents an amide or an ester, Y represents an amide or an ester, or may be absent, P represents an integer from 1 to 10, m and n are integers equal to or greater than 1);
a step for laminating a layer to which a pattern from a mold is to be transferred on a layer of the nanoimprinting resin; and
a step for transferring the pattern from the mold.
8 . The method for manufacturing a nanoimprinting substrate of claim 7 , wherein:
the layer to which the pattern from the mold is to be transferred is a thermoplastic resin, the steps for transferring the pattern from the mold comprising: a step for heating the substrate on which the thermoplastic resin is laminated to a temperature higher than the glass transition temperature of the thermoplastic resin; a step for pressing the mold; a step for cooling the substrate to a temperature lower than the glass transition temperature of the thermoplastic resin; and a step for detaching the mold.
9 . The method for manufacturing a nanoimprinting substrate of claim 7 , wherein:
the layer to which the pattern from the mold is to be transferred is a thermosetting resin, the steps for transferring the pattern from the mold comprising: a step for pressing the mold at a temperature lower than the glass transition temperature of the thermosetting resin; a step for heating the substrate on which the thermosetting resin is laminated to a temperature higher than the glass transition temperature of the thermosetting resin; and a step for detaching the mold.
10 . The method for manufacturing a nanoimprinting substrate of claim 7 , wherein:
the layer to which the pattern from the mold is to be transferred is formed by a solution containing a polymerizable monomer and a photopolymerization initiator, the steps for transferring the pattern from the mold comprising: a step for pressing the mold; a step for cross-linking/curing the polymerizable monomer; and a step for detaching the mold.
11 . The method for manufacturing a nanoimprinting substrate of claim 7 , wherein m and n of the nanoimprinting resin have a ratio such that m:n=1:99-90:10.
12 . The method for manufacturing a nanoimprinting substrate of claim 7 , wherein two of the R 1 -R 5 of the nanoimprinting resin represent —OH.Join the waitlist — get patent alerts
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