US2015298387A1PendingUtilityA1

Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate

Assignee: JAPAN SCIENCE & TECH AGENCYPriority: Dec 5, 2012Filed: Nov 13, 2013Published: Oct 22, 2015
Est. expiryDec 5, 2032(~6.4 yrs left)· nominal 20-yr term from priority
C09D 133/24C08F 220/70B29K 2033/00B32B 27/00B29C 59/022G03F 7/0002B29C 59/005B32B 27/30B32B 27/08C08F 220/54
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Claims

Abstract

Provided is a resin for nanoimprinting, which is capable of preventing removal of a transfer-receiving resin from a substrate when a mold is separated during nanoimprinting, and which is also capable of transferring a pattern on a mold to a transfer-receiving resin with high accuracy during thermal nanoimprinting, while improving the throughput. A resin for nanoimprinting, which is represented by formula (1). (In the formula, each of R 1 -R 5 independently represents —H or —OH, and at least one of the R 1 -R 5 moieties represents —OH; R 6 represents a linear, branched or cyclic alkyl group having 1-20 carbon atoms, an aryl group having 6-20 carbon atoms or an aralkyl group having 7-20 carbon atoms; X represents an amide or an ester; Y may be absent, or represents an amide or an ester; P represents an integer of 1-10; and each of m and n represents an integer of 1 or more.)

Claims

exact text as granted — not AI-modified
1 . A nanoimprinting resin represented by formula (1) below. 
       
         
           
           
               
               
           
         
         (In the formula, each of R 1 -R 5  independently represents —H or —OH, at least one of R 1 -R 5  representing —OH. R 6  represents a C 1-20  linear, branched, or cyclic alkyl group, a C 6-20  aryl group, or a C 7-20  aralkyl group. X represents an amide or an ester. Y represents an amide or an ester, or may be absent. P represents an integer from 1 to 10. m and n are integers equal to or greater than 1.) 
       
     
     
         2 . The nanoimprinting resin of  claim 1 , wherein m and n have a ratio such that m:n=1:99-90:10. 
     
     
         3 . The nanoimprinting resin of  claim 1 , wherein two of the R 1 -R 5  represent —OH. 
     
     
         4 . The nanoimprinting resin of  claim 1 , wherein the nanoimprinting resin is used between a substrate and a transfer-receiving resin to which a mold is to be transferred. 
     
     
         5 . A laminate comprising the nanoimprinting resin of  claim 1 . 
     
     
         6 . A substrate comprising the nanoimprinting resin of  claim 1 . 
     
     
         7 . A method for manufacturing a nanoimprinting substrate, comprising:
 a step for laminating the nanoimprinting resin represented by formula (1) below onto a substrate:   
       
         
           
           
               
               
           
         
         (in the formula, each of R 1 -R 5  independently represents —H or —OH, at least one of R 1 -R 5  representing —OH, R 6  represents a C 1-20  linear, branched, or cyclic alkyl group, a C 6-20  aryl group, or a C 7-20  aralkyl group, X represents an amide or an ester, Y represents an amide or an ester, or may be absent, P represents an integer from 1 to 10, m and n are integers equal to or greater than 1); 
         a step for laminating a layer to which a pattern from a mold is to be transferred on a layer of the nanoimprinting resin; and 
         a step for transferring the pattern from the mold. 
       
     
     
         8 . The method for manufacturing a nanoimprinting substrate of  claim 7 , wherein:
 the layer to which the pattern from the mold is to be transferred is a thermoplastic resin, the steps for transferring the pattern from the mold comprising:   a step for heating the substrate on which the thermoplastic resin is laminated to a temperature higher than the glass transition temperature of the thermoplastic resin;   a step for pressing the mold;   a step for cooling the substrate to a temperature lower than the glass transition temperature of the thermoplastic resin; and   a step for detaching the mold.   
     
     
         9 . The method for manufacturing a nanoimprinting substrate of  claim 7 , wherein:
 the layer to which the pattern from the mold is to be transferred is a thermosetting resin, the steps for transferring the pattern from the mold comprising:   a step for pressing the mold at a temperature lower than the glass transition temperature of the thermosetting resin;   a step for heating the substrate on which the thermosetting resin is laminated to a temperature higher than the glass transition temperature of the thermosetting resin; and   a step for detaching the mold.   
     
     
         10 . The method for manufacturing a nanoimprinting substrate of  claim 7 , wherein:
 the layer to which the pattern from the mold is to be transferred is formed by a solution containing a polymerizable monomer and a photopolymerization initiator, the steps for transferring the pattern from the mold comprising:   a step for pressing the mold;   a step for cross-linking/curing the polymerizable monomer; and   a step for detaching the mold.   
     
     
         11 . The method for manufacturing a nanoimprinting substrate of  claim 7 , wherein m and n of the nanoimprinting resin have a ratio such that m:n=1:99-90:10. 
     
     
         12 . The method for manufacturing a nanoimprinting substrate of  claim 7 , wherein two of the R 1 -R 5  of the nanoimprinting resin represent —OH.

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