US2015315718A1PendingUtilityA1

Metal pretreatment modification for improved throwpower

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Assignee: PPG IND OHIO INCPriority: May 5, 2014Filed: May 5, 2014Published: Nov 5, 2015
Est. expiryMay 5, 2034(~7.8 yrs left)· nominal 20-yr term from priority
Inventors:Nathan J. SilvernailKristen KruszewskiKevin T. Sylvester
C23C 22/34C23C 22/80C25D 5/34C09D 7/40C25D 13/04C23C 22/83C25D 13/22C09D 5/4488C25D 13/20C09D 5/4476
55
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Claims

Abstract

A pretreatment composition and a method for pretreating a metal substrate is disclosed. The method comprises: (a) pretreating the metal substrate with a Group IV(b) metal ion, followed by (b) treating the substrate of (a) with a composition comprising: (i) a Group IV(b) metal ion, (ii) a copper ion, (iii) a fluoride ion, and (iv) an organophosphonic acid, followed by (c) electrodepositing a cationic electrodepositable composition on the metal substrate.

Claims

exact text as granted — not AI-modified
1 . A composition for treating a metal substrate comprising:
 (a) a Group IV(b) metal ion,   (b) a copper ion,   (c) a fluoride ion, and   (d) an organophosphonic acid.   
     
     
         2 . The composition of  claim 1  wherein (a) is derived from a zirconium compound or mixtures of zirconium compounds. 
     
     
         3 . The composition of  claim 1  in which (c) is derived from the group comprising HF, NH 4 F, NH 4 HF 2 , NaF and NaHF 2 . 
     
     
         4 . The composition of  claim 1  in which the organophosphonic acid is a monophosphonic acid. 
     
     
         5 . The composition of  claim 1  in which the organo group of the organophosphonic acid has 6 or less carbon atoms. 
     
     
         6 . The composition of  claim 1  in which the organo group of the organophosphonic acid has from 2 to 4 carbon atoms. 
     
     
         7 . The composition of  claim 1  in which (a) is present in the composition in amounts of 50 to 300 parts per million (ppm) based on elemental metal and on total weight of the composition. 
     
     
         8 . The composition of  claim 1  in which (b) is present in the composition in amounts of 5 to 40 ppm based on elemental copper and on total weight of the composition. 
     
     
         9 . The composition of  claim 1  in which (c) is present in the composition in amounts of 50 to 200 ppm based on elemental fluorine and on total weight of the composition. 
     
     
         10 . The composition of  claim 1  in which (d) is present in the composition in amounts of 15 to 50 ppm based on elemental phosphorus and on total weight of the composition. 
     
     
         11 . A method for coating a metal substrate comprising:
 (a) pretreating the metal substrate with a Group IV(b) metal ion, followed by   (b) treating the substrate of (a) with a composition comprising:
 (i) a Group IV(b) metal ion, 
 (ii) a copper ion, 
 (iii) a fluoride ion, and 
 (iv) an organophosphonic acid, followed by 
   (c) electrodepositing a cationic electrodepositable composition on the substrate of (b).   
     
     
         12 . The method of  claim 11  in which the Group IV(b) metal ion of (a) is derived from a zirconium compound or mixture of zirconium compounds. 
     
     
         13 . The method of  claim 12  in which the Group IV(b) metal ion of (a) is present in an aqueous composition in amounts of 50 to 300 ppm based on elemental Group IV(b) metal and on the total weight of the composition. 
     
     
         14 . The method of  claim 11  in which the Group IV(b) metal ion of (b) (i) is derived from a zirconium compound or mixtures of zirconium compounds. 
     
     
         15 . The method of  claim 11  in which the organophosphonic acid is a monophosphonic acid. 
     
     
         16 . The method of  claim 11  in which the organo group of the organophosphonic acid has 6 or less carbon atoms. 
     
     
         17 . The method of  claim 11  in which the organo group of the organophosphonic acid has from 2 to 4 carbon atoms. 
     
     
         18 . The method of  claim 11  in which (b) (i) is present in the composition in amounts of 50 to 300 ppm based on elemental Group IV(b) metal and on total weight of the composition. 
     
     
         19 . The method of  claim 11  in which (b) (ii) is present in the composition in amounts of 5 to 40 ppm based on elemental copper and on total weight of the composition. 
     
     
         20 . The method of  claim 11  in which (b) (iii) is present in the composition in amounts of 50 to 200 ppm based on elemental fluorine and on total weight of the composition. 
     
     
         21 . The method of  claim 11  in which (b) (iv) is present in the composition in amounts of 15 to 50 ppm based on elemental phosphorus and on total weight of the composition.

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