Ultra-thin Metal Oxide and Carbon-Metal Oxide Films Prepared by Atomic Layer Deposition (ALD)

Abstract

Ultra-thin porous films are deposited on a substrate in a process that includes laying down an organic polymer, inorganic material or inorganic-organic material via an atomic layer deposition or molecular layer deposition technique, and then treating the resulting film to introduce pores. The films are characterized in having extremely small thicknesses of pores that are typically well less than 50 nm in size.

1 . A process for producing a porous film on a substrate, comprising (a) applying a 0.5 to 50 nm-thick film of an organic polymer or an inorganic-organic hybrid material to at least a portion of the surface of a substrate via an atomic layer deposition process and (b) forming pores in the film by oxidizing the film by heating the film in the presence of air or oxygen at a temperature of at least 400° C. or by contacting the film with water. 
     
     
         2 . (canceled) 
     
     
         3 . The process of  claim 1 , wherein the porous film has a thickness of at least 2 nm. 
     
     
         4 . The process of  claim 3 , wherein the porous film has a thickness of up to 30 nm. 
     
     
         5 . The process of  claim 4 , wherein the porous film has a surface area of at least 10 m 2 /g. 
     
     
         6 . The process of  claim 5 , wherein the porous film has a surface area of at least 100 m 2 /g. 
     
     
         7 . (canceled) 
     
     
         8 . The process of  claim 6 , wherein the porous film has pores that are mainly in the size range of from 2 to 100 angstroms. 
     
     
         9 . The process of  claim 8 , wherein the porous film is essentially free of pores having widths greater than 1000 angstroms. 
     
     
         10 . The process of  claim 9 , wherein in step a), an inorganic-organic hybrid material is formed. 
     
     
         11 . The process of  claim 10 , wherein in step a), alucone or a zinc-ethylene glycol hybrid material (zinc alkoxide), or a titanium-ethylene glycol (titanium alkoxide) hybrid material is formed. 
     
     
         12 . The process of  claim 10  wherein the substrate material is or contains catalytic material; a reagent for a chemical reaction; a porous support for a membrane or filtration device; a pharmaceutical or nutrient; or a MEMS device or sensor. 
     
     
         13 . A substrate having a coating of a porous film, made in accordance with  claim 1 . 
     
     
         14 . A substrate coated on at least a portion of its surface with a porous film having a thickness of from 0.5 to 50 nm, wherein the film has a BET surface area of at least 100 m 2 /g and contains pores having a pore width of from 2 to 5000 angstroms. 
     
     
         15 . The coated substrate of  claim 14  wherein the substrate material is or contains catalytic material; a reagent for a chemical reaction; a porous support for a membrane or filtration device; or a pharmaceutical or nutrient; or a MEMS device or sensor. 
     
     
         16 . The coated substrate of  claim 15 , wherein the substrate material is or contains a catalytic material. 
     
     
         17 . A process comprising conducting a chemical reaction in the present of the coated substrate of  claim 16 . 
     
     
         18 . The coated substrate of  claim 15 , wherein the substrate material is or contains a pharmaceutical or nutrient. 
     
     
         19 . A method of delivering a pharmaceutical or nutrient to a living organism, comprising administering the coated substrate of  claim 18  to the organism. 
     
     
         20 . The coated substrate of  claim 15 , wherein the substrate material is or contains a MEMS device or sensor. 
     
     
         21 . The coated substrate of  claim 14  or  15  wherein the porous film is a metal oxide or carbon film.