Ozone oxidation process for treatment of water containing azoles and azole-type compounds

Abstract

The present invention is generally directed to the use of an ozone oxidation process to remove azoles and azole-type compounds from wastewater. Specifically, the present invention is directed to a chemical treatment system for wastewater, including: an oxidation module receiving wastewater input and outputting an effluent; wherein the oxidation module removes azole-type compounds from the wastewater; and wherein the effluent has a reduction in azole-type compounds greater than ninety percent (90%). In accordance with some embodiments, the present invention provides an oxidation module receiving as inputs: wastewater received from a chemical mechanical polishing process and ozone gas received from an ozone generator; the oxidation module outputting an effluent; wherein the oxidation module removes azole-type compounds from the input wastewater; wherein the effluent has a reduction in azole-type compounds greater than ninety percent (90%); and wherein the oxidation module does not require ferrous treatment or solid-liquid separation before treatment.

What is claimed is: 
     
         1 . A chemical treatment system for wastewater, comprising:
 an oxidation module receiving as an input wastewater and outputting an effluent;   wherein the oxidation module removes azole-type compounds from the input wastewater; and   wherein the effluent has a reduction in azole-type compounds greater than ninety percent (90%).   
     
     
         2 . The system of  claim 1 , wherein the wastewater is received from semiconductor fabrication processes. 
     
     
         3 . The system of  claim 2 , wherein the semiconductor fabrication processes comprise chemical mechanical polishing (CMP). 
     
     
         4 . The system of  claim 1 , wherein the azole-type compounds comprise azole compounds and their derivatives including benzotriazole, pyrazole, 4-methyl-1-H-benzotrazole, 5-methyl-1-H-benzotrazole, imidazole, 1,2,4 1H-triazole, 3-amino triazole, tetrazole, oxazole, thiazole, diazole, 1,2,3-thiadiazole. 
     
     
         5 . The system of  claim 1 , wherein the effluent has a reduction in azole-type compounds greater than ninety five percent (95%). 
     
     
         6 . The system of  claim 1 , wherein the oxidation module receives as an additional input ozone gas. 
     
     
         7 . The system of  claim 1 , wherein the oxidation module is the sole treatment for the reduction of azole-type compounds. 
     
     
         8 . The system of  claim 1 , wherein the wastewater may comprise solid and liquid components, and wherein the oxidation module is the sole treatment for the reduction of azole-type compounds. 
     
     
         9 . The system of  claim 1 , wherein the oxidation module removes organic materials having a chemical oxygen demand (COD). 
     
     
         10 . The system of  claim 1 , wherein the wastewater treated by the oxidation module comprises hydrogen peroxide (H2O2). 
     
     
         11 . The system of  claim 1 , wherein the ferrous treatment or solid-liquid separation is not required as a pretreatment to the oxidation module. 
     
     
         12 . The system of  claim 1 , wherein the wastewater treated by the oxidation module has a pH ranging from 2 to 8. 
     
     
         13 . A chemical treatment system for wastewater, comprising:
 an oxidation module receiving as inputs:
 wastewater received from a chemical mechanical polishing process; and 
 ozone gas received from an ozone generator; 
   the oxidation module outputting an effluent;   wherein the oxidation module removes azole-type compounds from the input wastewater;   wherein the effluent has a reduction in azole-type compounds greater than ninety percent (90%); and   wherein the oxidation module does not require ferrous treatment or solid-liquid separation before treatment.   
     
     
         14 . The system of  claim 13 , wherein the azole-type compounds comprise azole compounds and their derivatives including benzotriazole, pyrazole, 4-methyl-1-H-benzotrazole, 5-methyl-1-H-benzotrazole, imidazole, 1,2,4 1H-triazole, 3-amino triazole, tetrazole, oxazole, thiazole, diazole, 1,2,3-thiadiazole. 
     
     
         15 . The system of  claim 13 , wherein the effluent has a reduction in azole-type compounds greater than ninety five percent (95%). 
     
     
         16 . The system of  claim 13 , wherein the oxidation module is the sole treatment for the reduction of azole-type compounds. 
     
     
         17 . The system of  claim 13 , wherein the wastewater may comprise solid and liquid components, and wherein the oxidation module is the sole treatment for the reduction of azole-type compounds. 
     
     
         18 . The system of  claim 13 , wherein the oxidation module removes organic materials having a chemical oxygen demand (COD). 
     
     
         19 . The system of  claim 13 , wherein the wastewater treated by the oxidation module comprises hydrogen peroxide (H2O2).