US2015380651A1PendingUtilityA1
Patterning devices using fluorinated compounds
Est. expiryApr 10, 2028(~1.7 yrs left)· nominal 20-yr term from priority
H10K 71/233G03F 7/0035H01L 51/0097H01L 51/52H01L 51/0014Y02P70/50H10K 10/82H10K 10/464H10K 71/621H10K 10/466H10K 77/111H10K 50/80H10K 71/20Y10T428/24479G03F 7/70058Y02E10/549
50
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Claims
Abstract
A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.
Claims
exact text as granted — not AI-modified1 - 21 . (canceled)
22 . A spatially patterned structured produced according to a method comprising:
forming a layer of a material on at least a portion of a substructure of said spatially patterned structure; forming a barrier layer of a fluorinated material on said layer of material to provide an intermediate structure; and exposing said intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of said intermediate structure, wherein said barrier layer substantially protects said layer of said material from chemical and structural changes during said exposing.
23 . A diode, comprising: a substructure; a thin film of an n-channel organic semiconductor formed on said substructure; a thin film of a p-channel organic semiconductor formed on said substructure in a position laterally displaced from said thin film of said n-type organic semiconductor so as to form a p-n heterojunction in a lateral arrangement on said substructure.
24 . A diode according to claim 23 , further comprising: a first electrode in electrical contact with said thin film of said n-channel organic semiconductor at a position displaced away from said p-n heterojunction; and a second electrode in electrical contact with said thin film of said p-channel organic semiconductor at a position displaced away from said p-n heterojunction.
25 . A diode according to claim 24 , further comprising a third electrode arranged proximate said p-n heterojunction, wherein said third electrode is suitable to control an electric field within region proximate said p-n heterojunction.
26 . A diode according to claim 23 , wherein said substructure comprises a substrate.
27 . A diode according to claim 26 , wherein said substrate is a flexible substrate.Cited by (0)
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