US2016027791A1PendingUtilityA1

Three-Dimensional Offset-Printed Memory

Assignee: CHENGDU HAICUN IP TECHNOLOGY LLCPriority: Sep 1, 2011Filed: Oct 7, 2015Published: Jan 28, 2016
Est. expirySep 1, 2031(~5.1 yrs left)· nominal 20-yr term from priority
Inventors:Guobiao Zhang
H10W 90/754H10W 90/752H10W 90/734H10W 90/732H10W 90/291H10W 90/24H10W 74/00H10W 72/884H10W 90/00H10D 88/01H10D 84/038H01L 27/11206H10B 20/25H10B 20/10G11C 17/16G11C 2213/71G11C 17/18G11C 17/00G11C 17/06G11C 11/56G11C 5/02G11C 8/06H10B 20/50
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Claims

Abstract

The present invention discloses a three-dimensional offset-printed memory (3D-oP). Compared with a conventional three-dimensional mask-programmed read-only memory (3D-MPROM), it has a lower data-mask count and thereby a lower data-mask cost. The mask-patterns for different memory levels/bits-in-a-cell are merged onto a multi-region data-mask. At different printing steps, a wafer is offset by different values with respect to said data-mask. Accordingly, data-patterns are printed into different memory levels/bits-in-a-cell from a same data-mask.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method of making a three-dimensional offset-printed memory (3D-oP), comprising the steps of:
 1) forming a substrate circuit on a semiconductor substrate;   2) forming a first memory level above said substrate, said first memory level comprising a first data-coding layer, wherein the data-pattern in said first data-coding layer is formed from a first portion of a data-mask;   3) forming a second memory level above said first memory level, said second memory level comprising a second data-coding layer, wherein the data-pattern in said second data-coding layer is formed from a second portion of said data-mask;   wherein said first and second portions are on a same data-mask.   
     
     
         2 . The method according to  claim 1 , wherein said substrate is aligned to a first position on said data-mask when forming the data-pattern in said first data-coding layer. 
     
     
         3 . The method according to  claim 2 , wherein said substrate is aligned to a second position on said data-mask when forming the data-pattern in said second data-coding layer. 
     
     
         4 . The method according to  claim 3 , wherein said second position is offset by a distance from said first position. 
     
     
         5 . The method according to  claim 1 , wherein the data-patterns are formed using photo-lithography or imprint-lithography. 
     
     
         6 . The method according to  claim 1 , wherein the total number of data-masks is fewer than the total number of data-coding layers.  
     
     
         7 . The method according to  claim 1 , wherein said 3D-oP further comprises a configurable-input/output (I/O) means for configuring the input of said memory based on the data-array sequence in said memory. 
     
     
         8 . The method according to  claim 7 , wherein said configurable-I/O means further comprises a storage means for storing the information related to the data-array sequence. 
     
     
         9 . The method according to  claim 8 , wherein said storage means is a non-volatile writable memory. 
     
     
         10 . A method of making a three-dimensional offset-printed memory (3D-oP), comprising the steps of:
 1) forming a substrate circuit on a semiconductor substrate;   2) forming a memory level above said substrate, said memory level comprising first and second data-coding layers, wherein the data-pattern in said first data-coding layer is formed from a first portion of a data-mask, and the data-pattern in said second data-coding layer is formed from a second portion of said data-mask;   wherein said first and second portions are on a same data-mask.   
     
     
         11 . The method according to  claim 10 , wherein said substrate is aligned to a first position on said data-mask when forming the data-pattern in said first data-coding layer. 
     
     
         12 . The method according to  claim 11 , wherein said substrate is aligned to a second position on said data-mask when forming the data-pattern in said second data-coding layer. 
     
     
         13 . The method according to  claim 12 , wherein said second position is offset by a distance from said first position.  
     
     
         14 . The method according to  claim 10 , wherein the data-patterns are formed using photo-lithography or imprint-lithography. 
     
     
         15 . The method according to  claim 10 , wherein the data-pattern in said first data-coding layer represents a first bit. 
     
     
         16 . The method according to  claim 10 , wherein the data-pattern in said second data-coding layer represents a second bit. 
     
     
         17 . The method according to  claim 10 , wherein the total number of data-masks is fewer than the total number of data-coding layers. 
     
     
         18 . The method according to  claim 10 , wherein said 3D-oP further comprises a configurable-input/output (I/O) means for configuring the output of said memory based on the data-array sequence in said memory. 
     
     
         19 . The method according to  claim 18 , wherein said configurable-I/O means further comprises a storage means for storing the information related to the data-array sequence. 
     
     
         20 . The method according to  claim 19 , wherein said storage means is a non-volatile writable memory.

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