US2016071703A1PendingUtilityA1
Method for Increasing Adhesion of Copper to Polymeric Surfaces
Est. expiryAug 6, 2033(~7.1 yrs left)· nominal 20-yr term from priority
H10P 95/08H10P 72/0468H10P 14/418H10P 14/412H10P 14/44H10W 74/476H10W 74/47H10W 20/4424H10W 20/425H10W 42/276H10W 42/20H01J 37/32715H01J 37/3244H01J 37/32082H01J 37/32192H01J 37/3405H01L 21/67207C23C 14/14C23C 14/20C23C 14/022C23C 14/35C23C 14/025C23C 14/0641
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Claims
Abstract
Disclosed herein are methods and systems for conditioning a polymeric layer on a substrate to enable adhesion of a metal layer to the polymeric layer. Techniques may include conditioning the polymeric layer with nitrogen-containing plasma to generate a nitride layer on the surface of the polymeric layer. In another embodiment, the conditioning may include depositing a CuN layer using a lower power copper sputtering process in a nitrogen rich environment. Following the condition process, a higher power copper deposition or sputtering process may be used to deposit copper onto the polymeric layer with good adhesion properties.
Claims
exact text as granted — not AI-modified1 . A system comprising:
a surface energy chamber comprising:
a first tray chuck;
an electrode adjacent to the first tray chuck, the electrode comprising one or more of the following: parallel plate electrode, a loop antenna, a helical antenna, or a magnetic coil; and
a power source in electrical communication with the electrode, the power comprising a radio frequency (RF) source or a microwave source;
a metal deposition chamber comprising:
a second tray chuck; and
a metal sputtering target adjacent to the sputter tray chuck;
an encapsulated device tray handling system to move a tray of encapsulated electronic devices between the surface energy chamber and the metal deposition chamber.
2 . The system of claim 1 , wherein the surface energy chamber uses the electrode and the power source to alter a surface energy or a surface state of the encapsulated electronic devices.
3 . The system of claim 1 , wherein the system comprises a gas delivery system for a nitrogen gas or a noble gas.
4 . The system of claim 3 , wherein the surface energy chamber can generate a nitrogen-containing plasma.
5 . The system of claim 1 , wherein the surface energy chamber comprises a plasma etch chamber.
6 . The system of claim 1 , wherein the encapsulated devices comprise:
a protective cover that isolates the device from ambient conditions; and electrical leads that can carry electrical current to or from the encapsulated device.
7 . The system of claim 1 , wherein the metal target electrode comprises copper.
8 . The system of claim 1 , wherein the encapsulated devices comprise a printed circuit board or at least two encapsulated devices that are coupled together to form the encapsulated device.
9 . The system of claim 1 , wherein the encapsulated devices are electrically isolated from each other.
10 . The system of claim 1 , wherein the tray comprises a JEDEC standard tray.
11 . The system of claim 1 , wherein the encapsulated devices comprise a polymeric layer.
12 . The system of claim 1 , wherein the encapsulated devices comprise a silicone impregnated epoxy.
13 . A system, comprising
a surface treatment component that can improve adhesion of a metal layer to an electronic device by using a nitrogen-containing plasma; a metal treatment component that can apply the metal layer to the electronic device comprising an electrical communication component; and a tray movement system that can move a tray including the electronic device between the surface treatment component and the metal treatment component.
14 . The system of claim 13 , wherein the electrical communication component comprises an electrical lead, a solder joint, or a ball contact
15 . The system of claim 14 , wherein the electrical lead, the solder joint, or the ball contact is configured to be coupled to a printed circuit board or another electronic device.
16 . The system of claim 13 , wherein the tray comprises a plurality of electronic devices.
17 . The system of claim 13 , wherein the electronic device comprises a polymeric layer that is treated in the surface treatment component.
18 . The system of claim 13 , wherein the electronic device comprises as a protective layer against electro-magnetic interference (EMI).
19 . The system of claim 13 , wherein the surface treatment comprises a plasma electrode and the metal treatment component comprises a magnetron or a sputter target.
20 . A system, comprising:
a first chamber comprising a means for altering a surface energy or a surface state of a plurality of encapsulated devices when they are disposed in the first chamber; a second chamber comprising a means for depositing a metal layer on the plurality of encapsulated devices when they are disposed in the second chamber; a tray movement apparatus comprising a means for moving a tray between the first chamber and the second chamber, the tray comprising the plurality of encapsulated devices.Cited by (0)
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