US2016071898A1PendingUtilityA1
Array of nanowires in a single cavity with anti-reflective coating on substrate
Est. expiryJun 4, 2029(~2.9 yrs left)· nominal 20-yr term from priority
Inventors:Munib Wober
H10F 77/124H10F 39/8067H10F 39/8063H10F 39/8053H10F 39/806H10F 39/805H10F 39/024H10F 39/184B82Y 99/00B82Y 20/00B82Y 15/00H01L 31/0304H01L 27/14649H01L 27/1462H01L 27/14621H01L 27/14625
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Claims
Abstract
An embodiment relates to image sensor comprising one or more nanowires on a substrate of a cavity, the nanowire being configured to transmit a first portion of an electromagnetic radiation beam incident on the sensor, and the substrate that absorbs a second portion of the electromagnetic radiation beam incident on the sensor, wherein the first portion is substantially different from the second portion. The substrate could have a anti-reflective material. The ratio of a diameter of the cavity to a diameter of the nanowire could be at less than about 10.
Claims
exact text as granted — not AI-modifiedWhat is claimed:
1 . An image sensor comprising one or more upstanding nanowires on a substrate,
wherein the nanowires are configured to transmit a first portion of an electromagnetic radiation incident on the sensor but not to transmit a second portion of the electromagnetic radiation incident on the sensor; wherein the substrate is configured to absorb the second portion of the electromagnetic radiation beam incident on the sensor, wherein the first portion has frequencies higher than a cutoff frequency and the second portion has frequencies lower than the cutoff frequency.
2 . The sensor of claim 1 , wherein the second portion comprises at least a portion of electromagnetic radiation that comes out from the nanowire.
3 . The sensor of claim 1 , wherein the substrate comprises an anti-reflective material on a front side of the substrate that is exposed to the electromagnetic radiation beam incident on the sensor.
4 . The sensor of claim 1 , wherein at least one of the one or more upstanding nanowires has a diameter above 100 nm.
5 . The sensor of claim 1 , wherein the nanowire is configured to separate wavelengths of the electromagnetic radiation beam incident on the nanowire at a selective wavelength.
6 . The sensor of claim 1 , wherein at least one of the one or more upstanding nanowires comprises GaAs.
7 . The sensor of claim 1 , wherein the substrate comprises GaAs.
8 . The sensor of claim 1 , wherein the sensor comprises a plurality of nanowires and is configured to have a substantially minor change in an optical response of the nanowire with a 10° change in a direction of the electromagnetic radiation beam incident on the sensor.
9 . The sensor of claim 1 , wherein each of the nanowires is configured to separate wavelengths of the electromagnetic radiation beam incident on the nanowire through at a selective wavelength, the sensor further comprising a pair of photosensitive elements comprising a central photosensitive element and a peripheral photosensitive element, wherein the central photosensitive element is operably coupled to the nanowire and the peripheral photosensitive element is operably coupled to the substrate around the nanowire.
10 . The sensor of claim 1 , wherein the nanowires are active elements configured to detect wavelengths of electromagnetic radiation transmitted through the nanowires.
11 . The sensor of claim 10 , wherein the active element is a photodiode.
12 . A device comprising the sensor of claim 1 , wherein the device is an image sensor.
13 . The device of claim 1 , wherein the nanowires comprise a waveguide.
14 . The device of claim 13 , further comprising a passivation layer around the waveguide.
15 . The device of claim 13 , further comprising a metal layer around the waveguide.
16 . The device of claim 12 , wherein the device comprises a filter that cuts off visible light and passes IR light.
17 . The device of claim 12 , further comprising a cladding surrounding the nanowires, wherein the nanowires have a nanowire index of refraction (n 1 ), and the cladding has a cladding index of refraction (n 2 ), wherein n 1 >n 2 , or n 1 =n 2 .
18 . The device of claim 13 , wherein the selective wavelength is a function of the diameter of the waveguide.
19 . The device of claim 13 , further comprising at least a pair of metal contacts with at least one of the metal contacts being contacted to the waveguide.
20 . The sensor of claim 1 , wherein the nanowires absorb the first portion.
21 . The sensor of claim 1 , wherein the nanowires are configured to store charge carriers generated by the first portion of the electromagnetic radiation beam in the nanowires.
22 . The device of claim 13 , wherein the nanowires are configured to store charge carriers generated by the first portion of the electromagnetic radiation beam in the nanowires.Cited by (0)
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