US2016111569A1PendingUtilityA1

Lattice matchable alloy for solar cells

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Assignee: SOLAR JUNCTION CORPPriority: Mar 29, 2010Filed: Dec 28, 2015Published: Apr 21, 2016
Est. expiryMar 29, 2030(~3.7 yrs left)· nominal 20-yr term from priority
H10F 77/1248H10F 77/124H10F 77/16H10F 71/1276H10F 71/1274H10F 71/1272H10F 10/163H10F 10/161H10F 10/19H10F 10/00H10F 77/12485H10F 99/00Y02P70/50Y02E10/544C22C 30/00H01L 31/036H01L 31/03046C22C 28/00Y10T428/12C30B 23/025C30B 33/02C30B 29/40C30B 23/066
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Claims

Abstract

An alloy composition for a subcell of a solar cell is provided that has a bandgap of at least 0.9 eV, namely, Ga 1-x In x N y As 1-y-z Sb z with a low antimony (Sb) content and with enhanced indium (In) content and enhanced nitrogen (N) content, achieving substantial lattice matching to GaAs and Ge substrates and providing both high short circuit currents and high open circuit voltages in GaInNAsSb subcells for multijunction solar cells. The composition ranges for Ga 1-x In x N y As 1-y-z Sb z are 0.07≦x≦0.18, 0.025≦y≦0.04 and 0.001≦z≦0.03.

Claims

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What is claimed is: 
     
         1 . An electron generating junction comprising a semiconductor alloy composition, wherein the semiconductor alloy composition is Ga 1-x In x N y As 1-y-z Sb z  wherein, the content values for x, y, and z are within composition ranges as follows: 0.07≦x≦0.18, 0.025≦y≦0.04 and 0.001≦z≦0.03;
 the content levels are selected such that the semiconductor alloy composition exhibits a bandgap from 0.9 eV to 1.1 eV; and a short circuit current density Jsc greater than 13 mA/cm 2  and an open circuit voltage Voc greater than 0.3 V when illuminated with a filtered 1 sun AM1.5D spectrum in which all light having an energy greater than the bandgap of GaAs is blocked. 
 
     
     
         2 . The electron generating junction of  claim 1 , wherein the semiconductor alloy composition is characterized by a thickness from 1 μm to 2 μm. 
     
     
         3 . The electron generating junction of  claim 1 , wherein the semiconductor alloy composition is characterized by a thickness greater than 1 μm. 
     
     
         4 . The electron generating junction of  claim 1 , wherein the semiconductor alloy composition is substantially lattice matched to GaAs. 
     
     
         5 . The electron generating junction of  claim 1 , wherein the semiconductor alloy composition is substantially lattice matched to Ge. 
     
     
         6 . The electron generating junction of  claim 1 , wherein the semiconductor alloy composition is n-doped. 
     
     
         7 . The electron generating junction of  claim 1 , wherein the semiconductor alloy composition is p-doped. 
     
     
         8 . The electron generating junction of  claim 1 , wherein the semiconductor alloy composition is in the form of a layer of semiconductor material. 
     
     
         9 . The electron generating junction of  claim 1 , wherein the content values are selected such that the semiconductor alloy composition is lattice matched to GaAs or Ge. 
     
     
         10 . A diode comprising the electron generating junction of  claim 1 . 
     
     
         11 . A photodiode comprising the electron generating junction of  claim 1 . 
     
     
         12 . A photodetector comprising the electron generating junction of  claim 1 .

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