US2016149069A1PendingUtilityA1
Method of manufacture of chalcogenide-based photovoltaic cells
Assignee: DOW GLOBAL TECHNOLOGIES LLCPriority: Apr 30, 2010Filed: Nov 23, 2015Published: May 26, 2016
Est. expiryApr 30, 2030(~3.8 yrs left)· nominal 20-yr term from priority
Inventors:Todd R. BrydenJeffrey L. Fenton, Jr.Gary E. MitchellKirk R. ThompsonMichael E. MillsDavid J. Parrillo
H10P 14/3428H10P 14/3236H10P 14/2923H10P 14/2901H10P 14/22H10F 77/1699H10F 77/244H10F 77/126H10F 71/138H10F 10/167H10F 71/00H10F 10/16H10F 77/12Y02E10/541H01L 31/0749H01L 31/1884H01L 31/022466H01L 31/03928C23C 14/0629C23C 14/3414Y02P70/50
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Claims
Abstract
The invention is a method of forming a cadmium sulfide based buffer on a copper chalcogenide based absorber in making a photovoltaic cell. The buffer is sputtered at relatively high pressures. The resulting cell has good efficiency and according to one embodiment is characterized by a narrow interface between the absorber and buffer layers. The buffer is further characterized according to a second embodiment by a relatively high oxygen content.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method comprising
forming a chalcogenide based absorber layer on a substrate forming a buffer layer comprising cadmium and sulfur on the absorber by sputtering at a working pressure of from 0.08 to 0.12 mbar.
2 . The method of claim 1 wherein the atmosphere is inert.
3 . The method of claim 1 wherein sputtering is from a target of cadmium and sulfur or compounds thereof.
4 . The method of claim 1 wherein an interface having a thickness of less than 10 nm is formed between the absorber layer and the buffer layer wherein the interface is defined on one side by the point at which the atomic fraction of cadmium exceeds 0.05 in energy dispersive x-ray spectroscopy scans of cross section of the cell and defined on a second side by the point at which the atomic fraction of indium and selenium is less than 0.05 in energy dispersive x-ray spectroscopy scans of cross section of the cell.
5 . The method of claim 4 wherein the interface is further defined on the second side by the atomic fraction of copper being less than 0.10.
6 . The method of claim 1 wherein the substrate is flexible and bears a backside electrical contact.
7 . The method of claim 1 further comprising forming a transparent conductive layer over the buffer layer.
8 . The method of claim 7 further comprising forming a window layer between the transparent conductive layer and the buffer layer.
9 . The method of claim 7 comprising forming an electrical connection grid on the transparent conductive layer.
10 . The method of claim 7 comprising providing a barrier layer over the transparent conductive layer.
11 . The method of claim 9 comprising providing a barrier layer over the transparent conductive layer and the grid.
12 . (canceled)
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20 . (canceled)Cited by (0)
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